Taiwan semiconductor manufacturing company, ltd. (20240337949). LITHOGRAPHY SYSTEM AND METHODS simplified abstract
Contents
LITHOGRAPHY SYSTEM AND METHODS
Organization Name
taiwan semiconductor manufacturing company, ltd.
Inventor(s)
LITHOGRAPHY SYSTEM AND METHODS - A simplified explanation of the abstract
This abstract first appeared for US patent application 20240337949 titled 'LITHOGRAPHY SYSTEM AND METHODS
The abstract describes a lithography exposure system that includes a light source, a substrate stage, and a mask stage with a reflector along the optical path.
- The lithography exposure system features a reflector with a first layer of a first material and thickness, a second layer of the same material but with a different thickness, and a third layer of a second material between the first and second layers.
- The reflector is designed to optimize the reflection of light in the lithography process, improving the quality and precision of the exposure on the substrate.
- By using layers of different materials and thicknesses in the reflector, the system can control the reflection properties and enhance the overall performance of the lithography process.
- This innovation aims to increase the efficiency and accuracy of lithography exposure, leading to better results in semiconductor manufacturing and other precision industries.
Potential Applications: - Semiconductor manufacturing - Microelectronics production - Optics and photonics industries
Problems Solved: - Improving the quality and precision of lithography exposure - Enhancing the efficiency of semiconductor manufacturing processes
Benefits: - Higher quality and more precise lithography results - Increased efficiency in semiconductor manufacturing - Improved performance in optics and photonics applications
Commercial Applications: Title: Advanced Lithography Exposure System for Semiconductor Manufacturing This technology can be used in semiconductor fabrication facilities to enhance the accuracy and efficiency of lithography processes, leading to higher quality semiconductor products and improved overall performance in the industry.
Questions about Lithography Exposure System: 1. How does the reflector in the lithography exposure system contribute to the overall performance of the process? 2. What are the specific advantages of using layers of different materials and thicknesses in the reflector design?
Original Abstract Submitted
a lithography exposure system includes a light source, a substrate stage, and a mask stage between the light source and the substrate stage along an optical path from the light source to the substrate stage. the lithography exposure system further comprises a reflector along the optical path. the reflector comprises: a first layer having a first material and a first thickness; a second layer having the first material and a second thickness different from the first thickness; and a third layer between the first layer and the second layer, and having a second material different from the first material.
