Taiwan semiconductor manufacturing company, ltd. (20240337918). EUV PHOTO MASKS AND MANUFACTURING METHOD THEREOF simplified abstract

EUV PHOTO MASKS AND MANUFACTURING METHOD THEREOF

Organization Name

taiwan semiconductor manufacturing company, ltd.

Inventor(s)

Hung-Yi Tsai of Zhubei City (TW)

Wei-Che Hsieh of Taipei (TW)

Ta-Cheng Lien of Cyonglin Township (TW)

Hsin-Chang Lee of Zhubei City (TW)

Ping-Hsun Lin of New Taipei City (TW)

Hao-Ping Cheng of Hsinchu (TW)

Ming-Wei Chen of Hsinchu (TW)

Szu-Ping Tsai of Hsinchu (TW)

EUV PHOTO MASKS AND MANUFACTURING METHOD THEREOF - A simplified explanation of the abstract

This abstract first appeared for US patent application 20240337918 titled 'EUV PHOTO MASKS AND MANUFACTURING METHOD THEREOF

The abstract describes a reflective mask with a substrate, a reflective multilayer, a capping layer, and an absorber layer containing specific materials and additional elements.

• Reflective mask with substrate, reflective multilayer, capping layer, and absorber layer.
• Absorber layer made of materials like CR, IR, PT, or CO based materials with additional elements like Si, B, Ge, Al, As, Sb, Te, Se, and Bi.

Potential Applications: This technology can be used in optical systems, photolithography, and semiconductor manufacturing processes.

Problems Solved: The reflective mask helps improve the efficiency and accuracy of optical systems and semiconductor manufacturing processes.

Benefits: Enhanced reflectivity, improved performance of optical systems, and increased precision in semiconductor manufacturing.

Commercial Applications: This technology can be applied in the production of advanced optical components for various industries, including electronics and telecommunications.

Prior Art: Researchers can explore prior patents related to reflective masks, absorber layers, and optical systems to understand the existing technology landscape.

Frequently Updated Research: Stay updated on advancements in reflective mask technology, materials science, and semiconductor manufacturing processes for potential improvements in performance and efficiency.

Questions about Reflective Masks: 1. How does the composition of the absorber layer impact the performance of the reflective mask? 2. What are the key differences between reflective masks with absorber layers made of different base materials?

Original Abstract Submitted

a reflective mask includes a substrate, a reflective multilayer disposed on the substrate, a capping layer disposed on the reflective multilayer, and an absorber layer disposed on the capping layer. the absorber layer includes a base material made of one or more of a cr based material, an ir based material, a pt based material, or co based material, and further contains one or more additional elements selected from the group consisting of si, b, ge, al, as, sb, te, se and bi.