Taiwan semiconductor manufacturing company, ltd. (20240302731). REFLECTIVE MASK simplified abstract

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REFLECTIVE MASK

Organization Name

taiwan semiconductor manufacturing company, ltd.

Inventor(s)

Pei-Cheng Hsu of Hsinchu (TW)

Ta-Cheng Lien of Hsinchu (TW)

Hsin-Chang Lee of Hsinchu (TW)

REFLECTIVE MASK - A simplified explanation of the abstract

This abstract first appeared for US patent application 20240302731 titled 'REFLECTIVE MASK

The abstract describes a reflective mask with multiple layers designed to improve performance.

  • The mask includes a substrate, a reflective multilayer, a capping layer, an intermediate layer, an absorber layer, and a cover layer.
  • The intermediate layer has a material with lower hydrogen diffusivity than the capping layer.

Potential Applications:

  • This reflective mask technology can be used in various optical applications such as lithography, microscopy, and astronomy.
  • It can also be applied in the manufacturing of reflective coatings for mirrors and lenses.

Problems Solved:

  • The technology addresses the issue of hydrogen diffusion, which can degrade the performance of reflective masks over time.
  • It provides enhanced durability and longevity to reflective masks used in sensitive optical systems.

Benefits:

  • Improved performance and longevity of reflective masks.
  • Enhanced optical properties leading to better image quality.
  • Increased efficiency and reliability in optical systems.

Commercial Applications:

  • The technology can be utilized in the production of high-quality optical components for industries such as semiconductor manufacturing, medical imaging, and scientific research.

Prior Art:

  • Researchers can explore prior patents related to reflective mask technology, hydrogen diffusion in optical materials, and advanced coating techniques.

Frequently Updated Research:

  • Stay updated on advancements in reflective mask technology, materials science, and optical coating methods to enhance the performance of optical systems.

Questions about Reflective Mask Technology: 1. How does the reflective multilayer contribute to the overall performance of the mask? 2. What are the specific advantages of using a material with lower hydrogen diffusivity in the intermediate layer of the mask?


Original Abstract Submitted

a reflective mask includes a substrate, a reflective multilayer disposed over the substrate, a capping layer disposed over the reflective multilayer, an intermediate layer disposed over the capping layer, an absorber layer disposed over the intermediate layer, and a cover layer disposed over the absorber layer. the intermediate layer includes a material having a lower hydrogen diffusivity than a material of the capping layer.

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