Taiwan semiconductor manufacturing company, ltd. (20240231241). DROPLET SPLASH CONTROL FOR EXTREME ULTRAVIOLET PHOTOLITHOGRAPHY simplified abstract
Contents
DROPLET SPLASH CONTROL FOR EXTREME ULTRAVIOLET PHOTOLITHOGRAPHY
Organization Name
taiwan semiconductor manufacturing company, ltd.
Inventor(s)
DROPLET SPLASH CONTROL FOR EXTREME ULTRAVIOLET PHOTOLITHOGRAPHY - A simplified explanation of the abstract
This abstract first appeared for US patent application 20240231241 titled 'DROPLET SPLASH CONTROL FOR EXTREME ULTRAVIOLET PHOTOLITHOGRAPHY
The abstract describes a photolithography system that uses tin droplets to produce extreme ultraviolet radiation for photolithography. The system irradiates the droplets with a laser, causing them to emit extreme ultraviolet radiation which is then reflected towards a photolithography target by a collector. To minimize splashback of the tin droplets onto the receiver, the system generates a net electric charge within the droplets using a charge electrode and decelerates the droplets by applying an electric field with a counter electrode.
- Tin droplets are utilized to generate extreme ultraviolet radiation for photolithography.
- The droplets are irradiated with a laser to energize them and emit extreme ultraviolet radiation.
- A collector reflects the radiation towards a photolithography target.
- To reduce splashback, a net electric charge is generated within the droplets using a charge electrode.
- The droplets are decelerated by applying an electric field with a counter electrode.
Potential Applications: - Semiconductor manufacturing - Microelectronics industry - Advanced lithography processes
Problems Solved: - Minimizing splashback of tin droplets onto the receiver - Enhancing precision and efficiency in photolithography processes
Benefits: - Improved accuracy and resolution in photolithography - Reduced material wastage and maintenance costs - Enhanced productivity and yield in semiconductor manufacturing
Commercial Applications: Title: Advanced Photolithography System for Semiconductor Manufacturing This technology can be used in the production of microchips, integrated circuits, and other semiconductor devices. It has the potential to revolutionize the lithography processes in the microelectronics industry, leading to higher quality products and increased efficiency in manufacturing.
Questions about Photolithography System: 1. How does the use of tin droplets improve the efficiency of extreme ultraviolet radiation generation? 2. What are the key advantages of utilizing an electric field to decelerate the droplets in the photolithography process?
Original Abstract Submitted
a photolithography system utilizes tin droplets to generate extreme ultraviolet radiation for photolithography. the photolithography system irradiates the droplets with a laser. the droplets become energized and emit extreme ultraviolet radiation. a collector reflects the extreme ultraviolet radiation toward a photolithography target. the photolithography system reduces splashback of the tin droplets onto the receiver by generating a net electric charge within the droplets using a charge electrode and decelerating the droplets by applying an electric field with a counter electrode.
