Taiwan semiconductor manufacturing company, ltd. (20240231240). IMMERSION EXPOSURE TOOL simplified abstract
Contents
IMMERSION EXPOSURE TOOL
Organization Name
taiwan semiconductor manufacturing company, ltd.
Inventor(s)
Yung-Yao Lee of Zhubei City (TW)
IMMERSION EXPOSURE TOOL - A simplified explanation of the abstract
This abstract first appeared for US patent application 20240231240 titled 'IMMERSION EXPOSURE TOOL
Simplified Explanation: The patent application describes a bottom lens for an immersion exposure tool that has a hydrophobic coating on the sidewalls to reduce thermal instability and overlay variation during operation.
Key Features and Innovation:
- Bottom lens for immersion exposure tool
- Hydrophobic coating on sidewalls
- Uncoated bottom portion for optical performance
- Reduction of thermal instability and overlay variation
Potential Applications: This technology can be used in semiconductor manufacturing processes where immersion exposure tools are utilized.
Problems Solved: The technology addresses issues related to thermal instability and overlay variation in immersion exposure tools, which can impact manufacturing yield and device failures.
Benefits:
- Increased manufacturing yield
- Decreased device failures
- Reduced rework and repairs
Commercial Applications: Potential commercial applications include semiconductor manufacturing companies looking to improve their production processes and reduce defects.
Questions about the Technology: 1. How does the hydrophobic coating on the sidewalls of the bottom lens reduce thermal instability? 2. What are the specific benefits of reducing overlay variation in immersion exposure tools?
Frequently Updated Research: There may be ongoing research in the semiconductor industry related to improving immersion exposure tools and their components.
By optimizing the bottom lens of an immersion exposure tool with a hydrophobic coating, manufacturers can potentially increase their manufacturing yield, reduce device failures, and minimize the need for rework and repairs. This innovation addresses key issues in semiconductor manufacturing processes, making it a valuable technology for companies in the industry.
Original Abstract Submitted
a bottom lens for an immersion exposure tool includes a hydrophobic coating on the sidewalls of the bottom lens. a bottom portion of the bottom lens is not coated with the hydrophobic coating to maintain the optical performance of the bottom lens and to not distort a pattern that is to be transferred to a substrate. the hydrophobic coating may reduce the thermal instability of the bottom lens. this may reduce overlay variation during operation of the immersion exposure tool, which may increase manufacturing yield, decrease device failures, and/or decrease rework and repairs.
