Taiwan semiconductor manufacturing company, ltd. (20240210619). GRATING COUPLER AND METHOD OF MANUFACTURING THE SAME simplified abstract
Contents
GRATING COUPLER AND METHOD OF MANUFACTURING THE SAME
Organization Name
taiwan semiconductor manufacturing company, ltd.
Inventor(s)
Feng-Wei Kuo of Zhudong Township (TW)
Hsing-Kuo Hsia of Jhubei City (TW)
GRATING COUPLER AND METHOD OF MANUFACTURING THE SAME - A simplified explanation of the abstract
This abstract first appeared for US patent application 20240210619 titled 'GRATING COUPLER AND METHOD OF MANUFACTURING THE SAME
The device described in the abstract includes a dielectric layer, a plurality of grating structures, and a dielectric material between and on top of the grating structures. The grating structures are arranged on the dielectric layer, separated from each other, and have different widths at the top and bottom.
- The device features a dielectric layer.
- It includes a plurality of grating structures.
- A dielectric material is present between and on top of the grating structures.
- The grating structures are separated from each other.
- Each grating structure has a different width at the top and bottom.
Potential Applications: - Optical devices - Sensors - Photonic integrated circuits
Problems Solved: - Enhancing light-matter interactions - Improving device performance - Increasing efficiency of optical components
Benefits: - Enhanced optical properties - Improved device functionality - Increased sensitivity in sensors
Commercial Applications: Title: Advanced Optical Devices for Enhanced Performance This technology can be utilized in the development of high-performance optical devices for various industries such as telecommunications, healthcare, and aerospace. The improved light-matter interactions and device efficiency make it a valuable asset in the market.
Questions about the technology: 1. How does the different width of the grating structures impact the device's performance? 2. What are the specific industries that can benefit the most from this technology?
Frequently Updated Research: Researchers are continually exploring new ways to optimize the design and materials used in these devices to further enhance their performance and applications. Stay updated on the latest advancements in the field to leverage the full potential of this technology.
Original Abstract Submitted
a device includes a dielectric layer, a plurality of grating structures, and a dielectric material between the plurality of grating structures and on top of the plurality of grating structures. the grating structures are arranged on the dielectric layer and separated from each other, the plurality of grating structures each having a bottom portion and top portion, the top portion having a first width and the bottom portion having a second width, the second width being larger than the first width.
