Taiwan semiconductor manufacturing co., ltd. (20240160828). INTEGRATED CIRCUIT LAYOUT GENERATION METHOD simplified abstract
Contents
- 1 INTEGRATED CIRCUIT LAYOUT GENERATION METHOD
- 1.1 Organization Name
- 1.2 Inventor(s)
- 1.3 INTEGRATED CIRCUIT LAYOUT GENERATION METHOD - A simplified explanation of the abstract
- 1.4 Simplified Explanation
- 1.5 Potential Applications
- 1.6 Problems Solved
- 1.7 Benefits
- 1.8 Potential Commercial Applications
- 1.9 Possible Prior Art
- 1.10 Unanswered Questions
- 1.11 Original Abstract Submitted
INTEGRATED CIRCUIT LAYOUT GENERATION METHOD
Organization Name
taiwan semiconductor manufacturing co., ltd.
Inventor(s)
Wen-Hsing Hsieh of Hsinchu (TW)
INTEGRATED CIRCUIT LAYOUT GENERATION METHOD - A simplified explanation of the abstract
This abstract first appeared for US patent application 20240160828 titled 'INTEGRATED CIRCUIT LAYOUT GENERATION METHOD
Simplified Explanation
The abstract describes a method of generating an IC layout diagram by analyzing gate resistance values and determining compliance with design specifications.
- Receiving an IC layout diagram with a gate region and gate via
- Analyzing gate resistance values of the gate region
- Retrieving a second gate resistance value from a reference based on location and width
- Determining non-compliance with design specifications
- Modifying the IC layout diagram based on non-compliance
Potential Applications
This technology could be applied in the semiconductor industry for optimizing IC layout designs to meet specific performance requirements.
Problems Solved
This technology helps identify and address potential design flaws in IC layout diagrams that could impact the functionality and performance of integrated circuits.
Benefits
The method allows for efficient analysis and modification of IC layout diagrams to ensure compliance with design specifications, leading to improved overall performance of integrated circuits.
Potential Commercial Applications
- "Optimizing IC Layout Designs for Enhanced Performance: A Guide to Gate Resistance Analysis"
Possible Prior Art
One possible prior art could be the use of simulation software to analyze and optimize IC layout designs for improved performance.
Unanswered Questions
How does this method compare to traditional manual analysis of IC layout diagrams?
The article does not provide a direct comparison between this method and traditional manual analysis methods.
What are the specific design specifications that the method checks for compliance?
The article does not specify the exact design specifications that the method checks for compliance.
Original Abstract Submitted
a method of generating an ic layout diagram includes receiving an ic layout diagram including a gate region and a gate via, the gate via being positioned at a location within an active region and along a width of the gate region extending across the active region, receiving a first gate resistance value of the gate region, retrieving a second gate resistance value from a resistance value reference based on the location and the width, using the first and second resistance values to determine that the ic layout diagram does not comply with a design specification, and based on the non-compliance with the design specification, modifying the ic layout diagram.
- Taiwan semiconductor manufacturing co., ltd.
- Ke-Ying Su of Hsinchu (TW)
- Jon-Hsu Ho of Hsinchu (TW)
- Ke-Wei Su of Hsinchu (TW)
- Liang-Yi Chen of Hsinchu (TW)
- Wen-Hsing Hsieh of Hsinchu (TW)
- Wen-Koi Lai of Hsinchu (TW)
- Keng-Hua Kuo of Hsinchu (TW)
- KuoPei Lu of Hsinchu (TW)
- Lester Chang of Hsinchu (TW)
- Ze-Ming Wu of Hsinchu (TW)
- G06F30/398
- G03F1/36
- G03F1/70
- G06F30/20