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Applied materials, inc. (20250095949). ADJUSTABLE EXIT ANGLE SOURCE FOR IONS AND NEUTRAL PARTICLES
[[Category:H01J37/08]] [[Category:H01J37/317]] ...

1 KB (223 words) - 04:20, 24 March 2025
18370158. ADJUSTABLE EXIT ANGLE SOURCE FOR IONS AND NEUTRAL PARTICLES (Applied Materials, Inc.)
[[Category:H01J37/08]] [[Category:H01J37/317]] ...

1 KB (223 words) - 05:07, 24 March 2025
Applied materials, inc. (20240420920). INTEGRATED GAS BOX AND ION SOURCE
[[Category:H01J37/317]] [[Category:H01J37/08]] ...

2 KB (277 words) - 06:48, 19 December 2024
18210884. INTEGRATED GAS BOX AND ION SOURCE (Applied Materials, Inc.)
[[Category:H01J37/317]] [[Category:H01J37/08]] ...

2 KB (277 words) - 07:17, 19 December 2024
Applied materials, inc. (20250069850). IN-SITU ION BEAM ANGLE MEASUREMENT
[[Category:H01J37/317]] [[Category:H01J37/08]] ...

1 KB (224 words) - 08:35, 17 March 2025
18236711. IN-SITU ION BEAM ANGLE MEASUREMENT (Applied Materials, Inc.)
[[Category:H01J37/317]] [[Category:H01J37/08]] ...

1 KB (224 words) - 09:45, 17 March 2025
Samsung electronics co., ltd. (20250095960). ION IMPLANTATION APPARATUS AND SEMICONDUCTOR DEVICE MANUFACTURING METHOD USING THE SAME
[[Category:H01J37/317]] [[Category:H01J37/08]] ...

2 KB (238 words) - 02:31, 24 March 2025
18650860. ION IMPLANTATION APPARATUS AND SEMICONDUCTOR DEVICE MANUFACTURING METHOD USING THE SAME (SAMSUNG ELECTRONICS CO., LTD.)
[[Category:H01J37/317]] [[Category:H01J37/08]] ...

2 KB (238 words) - 04:41, 24 March 2025
US Patent Application 18448026. REPELLENT ELECTRODE FOR ELECTRON REPELLING simplified abstract
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2 KB (364 words) - 08:34, 6 December 2023
Samsung electronics co., ltd. (20240282548). FOCUSED ION BEAM APPARATUS AND CONTROL METHOD THEREOF simplified abstract
[[Category:H01J37/16]] [[Category:H01J37/08]] ...

3 KB (395 words) - 05:55, 22 August 2024
18504630. FOCUSED ION BEAM APPARATUS AND CONTROL METHOD THEREOF simplified abstract (Samsung Electronics Co., Ltd.)
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3 KB (423 words) - 09:47, 22 August 2024
17835107. MOLTEN LIQUID TRANSPORT FOR TUNABLE VAPORIZATION IN ION SOURCES simplified abstract (Applied Materials, Inc.)
[[Category:H01J37/08]] [[Category:H01J27/08]] ...

3 KB (390 words) - 18:39, 1 January 2024
Samsung electronics co., ltd. (20240290570). REPELLER FOR ION GENERATING APPARATUS, ION GENERATING APPARATUS AND SEMICONDUCTOR WAFER ION IMPLANTATION APPARATUS simplified abstract
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3 KB (462 words) - 07:44, 29 August 2024
Taiwan semiconductor manufacturing co., ltd. (20240249906). ION SOURCE HEAD AND ION SOURCE HEAD CURVED LINER, DEFLECTOR, OR REPELLER simplified abstract
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4 KB (561 words) - 06:48, 25 July 2024
18158357. ION SOURCE HEAD AND ION SOURCE HEAD CURVED LINER, DEFLECTOR, OR REPELLER simplified abstract (Taiwan Semiconductor Manufacturing Co., Ltd.)
[[Category:H01J37/08]] [[Category:H01J37/317]] ...

4 KB (636 words) - 02:15, 26 July 2024
SK hynix Inc. patent applications on January 18th, 2024
IPC Code(s): G11C29/08, G11C11/406, G11C11/4096, G11C11/408 [[Category:G11C29/08]][[Category:G11C11/406]][[Category:G11C11/4096]][[Category:G11C11/408]][[Ca ...

12 KB (1,868 words) - 09:01, 30 January 2024
18281456. SPUTTER DEPOSITION SOURCE, MAGNETRON SPUTTER CATHODE, AND METHOD OF DEPOSITING A MATERIAL ON A SUBSTRATE simplified abstract (Applied Materials, Inc.)
[[Category:C23C14/08]] [[Category:H01J37/32]] ...

4 KB (542 words) - 06:50, 19 September 2024
Quantum Computing patent applications on September 12th, 2024
IPC Code(s): G06N10/70, G06N3/08 [[Category:G06N10/70]][[Category:G06N3/08]][[Category:CPC_G06N3/08]][[Category:Equal 1 Laboratories Ireland Limited]] ...

13 KB (1,878 words) - 07:19, 12 September 2024
Quantum Computing patent applications on 13th Sep 2024
IPC Code(s): G06N10/70, G06N3/08 [[Category:G06N10/70]][[Category:G06N3/08]][[Category:CPC_G06N3/08]][[Category:Equal 1 Laboratories Ireland Limited]] ...

13 KB (1,878 words) - 09:20, 19 September 2024
Taiwan semiconductor manufacturing co., ltd. (20240222071). Grid Structures Of Ion Beam Etching (IBE) Systems simplified abstract
[[Category:H01J37/305]] [[Category:H01J37/08]] ...

4 KB (614 words) - 16:44, 4 July 2024

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