Sk hynix inc. (20240349517). SEMICONDUCTOR DEVICE simplified abstract
Contents
SEMICONDUCTOR DEVICE
Organization Name
Inventor(s)
Ki Hong Lee of Suwon-si Gyeonggi-do (KR)
SEMICONDUCTOR DEVICE - A simplified explanation of the abstract
This abstract first appeared for US patent application 20240349517 titled 'SEMICONDUCTOR DEVICE
The semiconductor device described in the abstract includes a source layer, a stack structure, a channel layer, a slit, and a source pick-up line.
- The source layer has at least one groove on its upper surface.
- The stack structure is formed over the source layer.
- The channel layer passes through the stack structure and is in contact with the source layer.
- The slit passes through the stack structure and exposes the groove of the source layer.
- The source pick-up line is formed in the slit and the groove, and is contacted with the source layer.
Potential Applications: - This technology could be used in the development of advanced semiconductor devices for various electronic applications. - It may find applications in the manufacturing of high-performance transistors and integrated circuits.
Problems Solved: - This innovation addresses the need for improved semiconductor device structures with enhanced performance and functionality. - It provides a solution for optimizing the contact between different layers in a semiconductor device.
Benefits: - Enhanced performance and efficiency of semiconductor devices. - Improved reliability and durability of electronic components. - Potential for miniaturization and increased functionality in electronic devices.
Commercial Applications: Title: Advanced Semiconductor Device Technology for Enhanced Performance This technology has the potential for commercial applications in the semiconductor industry, particularly in the development of high-performance electronic devices for various consumer and industrial applications. The market implications include increased demand for advanced semiconductor components in sectors such as telecommunications, computing, and automotive electronics.
Questions about Semiconductor Device Technology: 1. How does the presence of grooves in the source layer contribute to the overall performance of the semiconductor device?
- The grooves in the source layer facilitate better contact and connectivity within the device, leading to improved efficiency and performance.
2. What are the key advantages of having a source pick-up line in the slit of the semiconductor device?
- The source pick-up line helps in efficiently transferring signals and power within the device, enhancing its overall functionality and reliability.
Original Abstract Submitted
a semiconductor device may include a source layer, a stack structure, a channel layer, a slit, and a source pick-up line. the source layer may include at least one groove in an upper surface thereof. the stack structure may be formed over the source layer. the channel layer may pass through the stack structure. the channel layer may be in contact with the source layer. the slit may pass through the stack structure. the slit may expose the groove of the source layer therethrough. the source pick-up line may be formed in the slit and the groove. the source pick-up line may be contacted with the source layer.
