Sk hynix inc. (20240304454). MANUFACTURING METHOD OF SEMICONDUCTOR DEVICE simplified abstract
Contents
MANUFACTURING METHOD OF SEMICONDUCTOR DEVICE
Organization Name
Inventor(s)
Pil Hoon Jung of Icheon-si (KR)
MANUFACTURING METHOD OF SEMICONDUCTOR DEVICE - A simplified explanation of the abstract
This abstract first appeared for US patent application 20240304454 titled 'MANUFACTURING METHOD OF SEMICONDUCTOR DEVICE
The manufacturing method of a semiconductor device involves forming a stack with alternating first material layers and second material layers. An inorganic material-containing polymer mask with a first stepped structure is then formed on the stack. Finally, a second stepped structure is created in the stack by etching using the polymer mask as an etching barrier.
- Formation of a stack with alternating first and second material layers
- Creation of an inorganic material-containing polymer mask with a first stepped structure
- Etching of the stack to form a second stepped structure using the polymer mask as an etching barrier
Potential Applications: - Semiconductor manufacturing - Electronics industry - Nanotechnology research
Problems Solved: - Precision etching in semiconductor devices - Improving manufacturing processes - Enhancing device performance
Benefits: - Increased efficiency in semiconductor manufacturing - Improved device functionality - Potential for smaller and more advanced devices
Commercial Applications: Title: Advanced Semiconductor Manufacturing Method This technology can be applied in the production of high-performance electronic devices, leading to advancements in various industries such as telecommunications, computing, and consumer electronics.
Prior Art: Researchers can explore prior patents related to semiconductor device manufacturing methods, polymer masks, and etching techniques to gain a deeper understanding of the existing technology landscape.
Frequently Updated Research: Researchers in the field of semiconductor manufacturing are constantly developing new methods and materials to improve device performance and efficiency. Stay updated on the latest advancements in polymer mask technology and etching processes for semiconductor devices.
Questions about Semiconductor Device Manufacturing: 1. What are the key challenges in semiconductor device manufacturing that this method addresses? 2. How does the use of a polymer mask improve the precision of etching in semiconductor devices?
Original Abstract Submitted
a manufacturing method of a semiconductor device may include: forming a stack including first material layers and second material layers that are alternately stacked; forming, on the stack, an inorganic material-containing polymer mask including a first stepped structure; and forming a second stepped structure in the stack by etching the stack using the polymer mask as an etching barrier.
