Seiko epson corporation (20240253310). Three Dimensional Shaping Device simplified abstract

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Three Dimensional Shaping Device

Organization Name

seiko epson corporation

Inventor(s)

Masayuki Gozu of Ina (JP)

Three Dimensional Shaping Device - A simplified explanation of the abstract

This abstract first appeared for US patent application 20240253310 titled 'Three Dimensional Shaping Device

The patent application describes a three-dimensional shaping device with a unique cleaning operation to maintain efficiency and precision in the shaping process.

  • The device includes an ejection section with a nozzle for shaping material, a stage for layering the material, a cleaning section with rotating cleaning members, a movement section to adjust positions, and a control section for operation.
  • The cleaning operation involves bringing the nozzle and cleaning member into contact while reciprocating the nozzle, ensuring thorough cleaning by rotating the cleaning member to cover different positions.
  • This innovative cleaning process enhances the device's longevity and accuracy by preventing material buildup and blockages.

Potential Applications:

  • Additive manufacturing
  • Prototyping
  • Customized product manufacturing

Problems Solved:

  • Prevents material buildup in the device
  • Ensures consistent shaping quality
  • Extends the device's lifespan

Benefits:

  • Improved efficiency in shaping operations
  • Enhanced precision and accuracy
  • Reduced maintenance requirements

Commercial Applications:

  • 3D printing services
  • Manufacturing industries
  • Research and development labs

Questions about the technology: 1. How does the cleaning operation impact the overall efficiency of the shaping device? 2. What materials are compatible with this three-dimensional shaping device?


Original Abstract Submitted

a three dimensional shaping device includes an ejection section that includes a nozzle and configured to eject a shaping material; a stage on which the shaping material is layered; a cleaning section including at least one cleaning member that rotates about a rotation axis; a movement section configured to change relative positions of the ejection section, the stage, and the cleaning section; and a control section. the control section controls the movement section to execute a cleaning operation of bringing the cleaning member and the nozzle into contact with each other while reciprocating the nozzle relative to the cleaning section so that the nozzle passes across the cleaning member a plurality of times and in the cleaning operation, the nozzle comes into contact with the cleaning member at different positions in a forward path and a return path of the nozzle by rotating the cleaning member about the rotation axis.