Samsung electronics co., ltd. (20240349511). CAPACITOR AND SEMICONDUCTOR DEVICE INCLUDING THE SAME simplified abstract

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CAPACITOR AND SEMICONDUCTOR DEVICE INCLUDING THE SAME

Organization Name

samsung electronics co., ltd.

Inventor(s)

Jungmin Park of Suwon-si (KR)

Ji-Sung Kim of Suwon-si (KR)

Han Jin Lim of Suwon-si (KR)

Hyungsuk Jung of Suwon-si (KR)

CAPACITOR AND SEMICONDUCTOR DEVICE INCLUDING THE SAME - A simplified explanation of the abstract

This abstract first appeared for US patent application 20240349511 titled 'CAPACITOR AND SEMICONDUCTOR DEVICE INCLUDING THE SAME

The abstract describes a capacitor with a unique dielectric layer that includes a ferroelectric layer and an auxiliary portion with a low energy band gap.

  • The capacitor consists of a first electrode and a second electrode separated by the dielectric layer.
  • The dielectric layer contains a ferroelectric layer and an auxiliary portion with an energy band gap lower than 4.0 eV.
  • The auxiliary portion is designed to enhance the performance of the capacitor.

Potential Applications:

  • Energy storage systems
  • Electronic devices
  • Power electronics

Problems Solved:

  • Improved energy storage capacity
  • Enhanced efficiency of electronic devices

Benefits:

  • Higher energy density
  • Increased performance of electronic devices
  • Longer lifespan of capacitors

Commercial Applications:

  • Capacitor manufacturing industry
  • Consumer electronics market
  • Renewable energy sector

Questions about the technology: 1. How does the low energy band gap of the auxiliary portion impact the performance of the capacitor? 2. What are the specific advantages of using a ferroelectric layer in the dielectric layer of the capacitor?


Original Abstract Submitted

a capacitor according to at least one embodiment may include a first electrode and a second electrode spaced apart from each other, and a dielectric layer disposed between the first electrode and the second electrode and including a ferroelectric layer and an auxiliary portion disposed in the ferroelectric layer, wherein an energy band gap eg of the auxiliary portion may be lower than about 4.0 ev.