Samsung electronics co., ltd. (20240349483). SEMICONDUCTOR DEVICE simplified abstract
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SEMICONDUCTOR DEVICE
Organization Name
Inventor(s)
SEMICONDUCTOR DEVICE - A simplified explanation of the abstract
This abstract first appeared for US patent application 20240349483 titled 'SEMICONDUCTOR DEVICE
The semiconductor device described in the abstract includes various components such as an active pattern, a bit line structure, spacer structures, contact plugs, and a conductive spacer.
- The active pattern is located on a substrate.
- The bit line structure is positioned on the central portion of the active pattern.
- Spacer structures are present on the sidewalls of the bit line structure.
- Lower contact plugs are situated on opposite end portions of the active pattern.
- Upper contact plugs, which may include a conductive pattern, are placed on the lower contact plugs.
- A conductive spacer covers the lower surface of the conductive pattern, contacting the outer sidewall of the first spacer structure.
Potential Applications: - This technology can be used in the manufacturing of advanced semiconductor devices. - It can improve the performance and efficiency of electronic devices.
Problems Solved: - Enhances the conductivity and connectivity of semiconductor devices. - Provides a more compact and efficient design for electronic components.
Benefits: - Improved functionality and performance of electronic devices. - Enhanced conductivity and connectivity in semiconductor devices.
Commercial Applications: Title: Advanced Semiconductor Device Technology for Enhanced Connectivity This technology can be applied in the production of high-performance electronic devices such as smartphones, computers, and other consumer electronics. It can also be utilized in the development of advanced computing systems and industrial equipment.
Questions about Semiconductor Device Technology: 1. How does the presence of spacer structures impact the performance of the semiconductor device? 2. What are the potential implications of using conductive spacers in semiconductor devices?
Frequently Updated Research: Researchers are constantly exploring new materials and designs to further enhance the efficiency and performance of semiconductor devices. Stay updated on the latest advancements in this field to leverage the full potential of this technology.
Original Abstract Submitted
a semiconductor device includes an active pattern on a substrate; a bit line structure on a central portion of the active pattern; a first spacer structure and a second spacer structure disposed on a first sidewall and a second sidewall, respectively, of the bit line structure, the first sidewall and the second sidewall of the bit line structure facing each other in the first direction; a lower contact plug on each of opposite end portions of the active pattern; and an upper contact plug on the lower contact plug. the upper contact plug may include a conductive pattern; and a conductive spacer covering a lower surface of the conductive pattern, wherein the conductive spacer contacts an outer sidewall of the first spacer structure, and does not contact an outer sidewall of the second spacer structure.
