Samsung electronics co., ltd. (20240347631). SEMICONDUCTOR DEVICE simplified abstract
Contents
SEMICONDUCTOR DEVICE
Organization Name
Inventor(s)
Seonhaeng Lee of Suwon-si (KR)
SEMICONDUCTOR DEVICE - A simplified explanation of the abstract
This abstract first appeared for US patent application 20240347631 titled 'SEMICONDUCTOR DEVICE
The semiconductor device described in the abstract features an outer active pattern on a substrate with a trench crossing it, an outer word line covering the trench wall, an inner active pattern covering the outer word line, an inner word line covering the inner active pattern, and a separation insulating pattern between the outer word line and the inner active pattern in the trench. The outer word line and the inner word line are insulated from each other.
- Outer active pattern on a substrate with a trench crossing it
- Outer word line covering the trench wall
- Inner active pattern covering the outer word line
- Inner word line covering the inner active pattern
- Separation insulating pattern between the outer word line and the inner active pattern in the trench
Potential Applications: - Semiconductor manufacturing - Memory devices - Integrated circuits
Problems Solved: - Improved insulation between word lines - Enhanced performance of semiconductor devices
Benefits: - Increased efficiency in data storage - Higher reliability in semiconductor devices
Commercial Applications: Title: Advanced Semiconductor Devices for Enhanced Performance This technology can be utilized in the production of memory chips, microprocessors, and other electronic devices, leading to improved performance and reliability in various industries such as consumer electronics, telecommunications, and automotive.
Prior Art: Readers can explore prior patents related to semiconductor device manufacturing processes, trench structures, and insulation techniques to gain a deeper understanding of the innovation presented in this patent application.
Frequently Updated Research: Stay updated on the latest advancements in semiconductor device technology, insulation materials, and manufacturing processes to enhance the performance and efficiency of electronic devices.
Questions about Semiconductor Devices: 1. How does the insulation pattern between word lines impact the overall performance of the semiconductor device? 2. What are the potential challenges in scaling up this technology for mass production in the semiconductor industry?
Original Abstract Submitted
a semiconductor device includes an outer active pattern on a substrate, the outer active pattern having a trench crossing the outer active pattern, an outer word line covering a wall of the trench, an inner active pattern covering the outer word line in the trench, an inner word line covering the inner active pattern in the trench, and a separation insulating pattern interposed between the outer word line and the inner active pattern in the trench. the outer word line and the inner word line are insulated from each other.
