Samsung electronics co., ltd. (20240341465). BRUSH CLEANING DEVICE AND CHEMICAL MECHANICAL POLISHING APPARATUS simplified abstract
Contents
BRUSH CLEANING DEVICE AND CHEMICAL MECHANICAL POLISHING APPARATUS
Organization Name
Inventor(s)
Seungjiun Lee of Suwon-si (KR)
BRUSH CLEANING DEVICE AND CHEMICAL MECHANICAL POLISHING APPARATUS - A simplified explanation of the abstract
This abstract first appeared for US patent application 20240341465 titled 'BRUSH CLEANING DEVICE AND CHEMICAL MECHANICAL POLISHING APPARATUS
The abstract describes a brush cleaning device that includes a brush with an electrode, a cleaning tank, a platen with an electrode that interacts with the brush's electrode, and a voltage supplier that creates an electrical field on the brush and platen.
- The brush has a cylindrical body with protrusions and pores, a particle collection pipe at its center, and a particle suction pipe connected to the pores.
- The cleaning tank accommodates the brush and platen, which both have electrodes for creating an electrical field.
- The voltage supplier supplies a voltage to form the electrical field on the brush and platen, facilitating the cleaning process.
Potential Applications: - Industrial cleaning processes - Laboratory equipment maintenance - Electronic component cleaning
Problems Solved: - Efficient removal of particles from brushes - Enhanced cleaning capabilities in hard-to-reach areas - Improved maintenance of sensitive equipment
Benefits: - Increased cleaning efficiency - Reduced downtime for maintenance - Extended lifespan of equipment
Commercial Applications: - Manufacturing facilities - Research laboratories - Electronics industry
Questions about the technology: 1. How does the interaction between the electrodes improve the cleaning process? 2. What are the advantages of using a brush with protrusions and pores for particle collection?
Original Abstract Submitted
a brush cleaning device includes a brush including an electrode therein; a cleaning tank in which the brush is accommodatable; a platen in the cleaning tank, the platen being spaced apart from the brush, and including an electrode therein that interacts with the electrode of the brush; and a voltage supplier having an electrode interacting with the electrode of the brush, and supplying a voltage to form an electrical field on the brush and the platen, wherein the brush includes a cylindrical body including a plurality of protrusions on a surface thereof, and pores in at least a portion of the plurality of protrusions; a particle collection pipe at a center of the cylindrical body; and a particle suction pipe in fluid communication with the particle collection pipe and extending radially to the pores at an outer surface of the brush.
