Samsung electronics co., ltd. (20240339334). SUBSTRATE PROCESSING APPARATUS simplified abstract
Contents
SUBSTRATE PROCESSING APPARATUS
Organization Name
Inventor(s)
Sangjine Park of Suwon-si (KR)
SUBSTRATE PROCESSING APPARATUS - A simplified explanation of the abstract
This abstract first appeared for US patent application 20240339334 titled 'SUBSTRATE PROCESSING APPARATUS
The abstract of a patent application describes a substrate processing apparatus that includes a processing chamber with a substrate support, a surface tension reducing agent supply system, and a controller to control the supply of the surface tension reducing agent.
- The substrate processing apparatus has a processing chamber with a substrate support.
- A surface tension reducing agent supply system provides the surface tension reducing agent as a gas to the processing chamber.
- The controller regulates the supply of the surface tension reducing agent through the supply system.
- The supply system includes supply ports to introduce the agent into the chamber and discharge ports to remove developer from the internal space.
Potential Applications: - Semiconductor manufacturing - Thin film deposition processes - Surface modification of substrates
Problems Solved: - Improved uniformity in substrate processing - Enhanced control over surface tension for better results
Benefits: - Increased efficiency in processing - Higher quality end products - Reduced defects in substrates
Commercial Applications: Title: Advanced Substrate Processing Apparatus for Semiconductor Manufacturing This technology can be utilized in semiconductor fabrication facilities to enhance the quality and efficiency of substrate processing, leading to improved overall production outcomes.
Questions about Substrate Processing Apparatus: 1. How does the surface tension reducing agent contribute to the processing of substrates? The surface tension reducing agent helps to improve the uniformity and quality of substrate processing by controlling the surface tension of the liquid.
2. What role does the controller play in the substrate processing apparatus? The controller is responsible for regulating the supply of the surface tension reducing agent, ensuring precise control over the processing conditions.
Original Abstract Submitted
a substrate processing apparatus includes a processing chamber having an internal space and a substrate support within the internal space, a surface tension reducing agent supply system that supplies a surface tension reducing agent as a gas to the processing chamber, and a controller that controls the supply of the surface tension reducing agent via the surface tension reducing agent supply system. the surface tension reducing agent supply system includes at least one supply port that is configured to supply the surface tension reducing agent to the internal space and at least one discharge port that is configured to remove developer from the internal space.
