Samsung electronics co., ltd. (20240318077). ETCHING COMPOSITION, METAL-CONTAINING FILM ETCHING METHOD USING THE SAME AND SEMICONDUCTOR DEVICE MANUFACTURING METHOD USING THE SAME simplified abstract
ETCHING COMPOSITION, METAL-CONTAINING FILM ETCHING METHOD USING THE SAME AND SEMICONDUCTOR DEVICE MANUFACTURING METHOD USING THE SAME
Organization Name
Inventor(s)
Kyuyoung Hwang of Suwon-si (KR)
Byungjoon Kang of Suwon-si (KR)
Daihyun Kim of Hwaseong-si (KR)
Mihyun Park of Hwaseong-si (KR)
Jungmin Oh of Hwaseong-si (KR)
ETCHING COMPOSITION, METAL-CONTAINING FILM ETCHING METHOD USING THE SAME AND SEMICONDUCTOR DEVICE MANUFACTURING METHOD USING THE SAME - A simplified explanation of the abstract
This abstract first appeared for US patent application 20240318077 titled 'ETCHING COMPOSITION, METAL-CONTAINING FILM ETCHING METHOD USING THE SAME AND SEMICONDUCTOR DEVICE MANUFACTURING METHOD USING THE SAME
Simplified Explanation: The patent application describes an etching composition used for etching metal-containing films in semiconductor device manufacturing.
Key Features and Innovation:
- Includes an oxidizer, an ammonium salt, an aqueous solvent, and an accelerator.
- Method of etching metal-containing films using the composition.
- Method of manufacturing semiconductor devices using the composition.
Potential Applications: The technology can be applied in the semiconductor industry for etching metal-containing films in the manufacturing process of semiconductor devices.
Problems Solved: The technology addresses the need for an effective etching composition for metal-containing films in semiconductor manufacturing.
Benefits:
- Improved etching process for metal-containing films.
- Enhanced efficiency in semiconductor device manufacturing.
- Consistent and reliable results in etching processes.
Commercial Applications: Commercial applications include semiconductor manufacturing companies looking to improve their etching processes for metal-containing films in device production.
Prior Art: Readers can explore prior art related to etching compositions and methods in semiconductor manufacturing to understand the evolution of such technologies.
Frequently Updated Research: Stay updated on the latest research in etching compositions and methods for semiconductor device manufacturing to incorporate advancements in the field.
Questions about Etching Compositions: 1. What are the key components of an etching composition for metal-containing films? 2. How does the etching composition improve the semiconductor device manufacturing process?
Original Abstract Submitted
an etching composition may include an oxidizer, an ammonium salt, an aqueous solvent, and an accelerator. a method of etching a metal-containing film may be performed using the etching composition, and a method of manufacturing a semiconductor device may be performed using the etching composition.
