Samsung electronics co., ltd. (20240304661). INTEGRATED CIRCUIT DEVICE simplified abstract
Contents
INTEGRATED CIRCUIT DEVICE
Organization Name
Inventor(s)
INTEGRATED CIRCUIT DEVICE - A simplified explanation of the abstract
This abstract first appeared for US patent application 20240304661 titled 'INTEGRATED CIRCUIT DEVICE
The integrated circuit device described in the patent application includes a substrate with a cell array region and a peripheral circuit region. There is a first ion implantation region in the upper portion of the substrate in the peripheral circuit region, with line trenches that cross the region.
- The device features a plurality of lower capacitor dielectric films covering the inner walls of line trenches.
- Buried conductive lines partially fill the line trenches and are placed on the lower capacitor dielectric films.
- First lower capacitor contacts are in contact with buried conductive lines, while second lower capacitor contacts are in contact with the first ion implantation region.
Potential Applications: - This technology can be used in the manufacturing of advanced integrated circuits for various electronic devices. - It can improve the performance and efficiency of semiconductor devices.
Problems Solved: - Enhances the capacitance and functionality of integrated circuits. - Helps in reducing signal interference and improving overall circuit performance.
Benefits: - Increased efficiency and performance of electronic devices. - Enhanced signal processing capabilities. - Improved reliability and durability of integrated circuits.
Commercial Applications: Title: Advanced Integrated Circuit Technology for Enhanced Performance This technology can be applied in the production of high-performance electronic devices such as smartphones, computers, and IoT devices. It can also be utilized in the automotive industry for advanced driver assistance systems and in the aerospace sector for communication and navigation systems.
Questions about the Technology: 1. How does this technology improve the functionality of integrated circuits? - This technology enhances the capacitance and signal processing capabilities of integrated circuits, leading to improved performance and efficiency. 2. What are the potential applications of this advanced integrated circuit technology? - The technology can be used in various electronic devices, automotive systems, and aerospace communication systems for enhanced performance and reliability.
Original Abstract Submitted
an integrated circuit device includes a substrate including a cell array region and a peripheral circuit region, a first ion implantation region located in an upper portion of the substrate in the peripheral circuit region, the first ion implantation region having a plurality of line trenches that extend in a first horizontal direction and cross the first ion implantation region, a plurality of lower capacitor dielectric films with each lower capacitor dielectric film configured to respectively cover inner walls of a respective line trench, a plurality of buried conductive lines that each partially fill a respective line trench and that are each respectively disposed on a respective lower capacitor dielectric film, a plurality of first lower capacitor contacts that are each in contact with a respective buried conductive line, and a plurality of second lower capacitor contacts that are in contact with the first ion implantation region.
