Samsung electronics co., ltd. (20240251496). SEMICONDUCTOR MANUFACTURING APPARATUS AND OPERATING METHOD THEREOF simplified abstract
Contents
SEMICONDUCTOR MANUFACTURING APPARATUS AND OPERATING METHOD THEREOF
Organization Name
Inventor(s)
Dohyung Kim of Hwaseong-si (KR)
Seongchul Hong of Suwon-si (KR)
Insung Kim of Seongnam-si (KR)
Jinhong Park of Yongin-si (KR)
Jungchul Lee of Hwaseong-si (KR)
SEMICONDUCTOR MANUFACTURING APPARATUS AND OPERATING METHOD THEREOF - A simplified explanation of the abstract
This abstract first appeared for US patent application 20240251496 titled 'SEMICONDUCTOR MANUFACTURING APPARATUS AND OPERATING METHOD THEREOF
The semiconductor manufacturing apparatus described in the patent application includes an oscillation unit with a first seed laser, a second seed laser, and a seed module. The first seed laser generates a first pulse, while the second seed laser generates a second pulse. An extreme ultraviolet generation unit utilizes these pulses to produce extreme ultraviolet light. The seed module consists of mirrors that guide the pulses along different paths, and a pulse control optical system with various optical elements.
- The semiconductor manufacturing apparatus features an oscillation unit with two seed lasers and a seed module.
- The extreme ultraviolet generation unit uses the pulses from the seed lasers to create extreme ultraviolet light.
- The seed module includes mirrors for directing the pulses along specific paths and a pulse control optical system with multiple optical elements.
- The pulse control optical system is positioned on a path that does not overlap with the seed lasers' paths.
- The third optical element in the pulse control optical system contains a lens between the first and second optical elements.
Potential Applications: - Semiconductor manufacturing processes - Extreme ultraviolet lithography - Advanced optical systems for precision control
Problems Solved: - Enhancing extreme ultraviolet light generation efficiency - Improving precision and control in semiconductor manufacturing processes
Benefits: - Increased accuracy and efficiency in semiconductor manufacturing - Enhanced performance of extreme ultraviolet lithography systems
Commercial Applications: Title: Advanced Semiconductor Manufacturing Apparatus for Extreme Ultraviolet Lithography This technology can be utilized in semiconductor fabrication facilities to improve the production of high-performance microchips. It has significant implications for the semiconductor industry, particularly in the development of cutting-edge electronic devices.
Questions about the technology: 1. How does the oscillation unit in the semiconductor manufacturing apparatus contribute to extreme ultraviolet light generation? 2. What are the advantages of using multiple seed lasers in the seed module for semiconductor manufacturing processes?
Original Abstract Submitted
disclosed are semiconductor manufacturing apparatuses and operating methods thereof. the semiconductor manufacturing apparatus includes an oscillation unit that includes a first seed laser, a second seed laser, and a seed module, wherein the first seed laser oscillates a first pulse, and wherein the second seed laser oscillates a second pulse, and an extreme ultraviolet generation unit configured to use the first and second pulses to generate extreme ultraviolet light. the seed module includes a plurality of mirrors configured to allow the first and second pulses to travel along first and second paths, respectively, and a pulse control optical system including a first optical element, a second optical element, and a third optical element. the pulse control optical system is on the second path that does not overlap the first path. the third optical element includes a lens between the first optical element and the second optical element.
