Samsung electronics co., ltd. (20240248418). SUBSTRATE PROCESSING APPARATUS AND METHOD OF FABRICATING SEMICONDUCTOR DEVICE USING THE SAME simplified abstract

SUBSTRATE PROCESSING APPARATUS AND METHOD OF FABRICATING SEMICONDUCTOR DEVICE USING THE SAME

Organization Name

samsung electronics co., ltd.

Inventor(s)

Seok Heo of Suwon-si (KR)

Cha Won Koh of Suwon-si (KR)

Sang Joon Hong of Suwon-si (KR)

Hyun Woo Kim of Suwon-si (KR)

Kyung-Won Kang of Suwon-Si (KR)

Dong-Wook Kim of Suwon-si (KR)

Kyung Won Seo of Suwon-si (KR)

Young Il Jang of Suwon-si (KR)

Yong Suk Choi of Suwon-si (KR)

SUBSTRATE PROCESSING APPARATUS AND METHOD OF FABRICATING SEMICONDUCTOR DEVICE USING THE SAME - A simplified explanation of the abstract

This abstract first appeared for US patent application 20240248418 titled 'SUBSTRATE PROCESSING APPARATUS AND METHOD OF FABRICATING SEMICONDUCTOR DEVICE USING THE SAME

Simplified Explanation: The patent application describes a substrate processing apparatus that includes a photoresist coater, a humidifier, and an exposer. The humidifier increases the moisture in the ambient where the photoresist film on the substrate is exposed before the exposer irradiates it with light.

• The substrate processing apparatus includes a photoresist coater, a humidifier, and an exposer.
• The humidifier increases the moisture in the ambient where the photoresist film on the substrate is exposed.
• The exposer irradiates the photoresist film with light after exposure to the humidified ambient.
• The humidifier is positioned between the photoresist coater and the exposer.
• This innovation aims to improve the quality and efficiency of photoresist film processing on substrates.

Potential Applications: 1. Semiconductor manufacturing 2. Microelectronics fabrication 3. Photolithography processes

Problems Solved: 1. Inconsistent photoresist film quality due to varying ambient moisture levels 2. Reduced efficiency in photoresist film processing 3. Lack of control over moisture content during exposure

Benefits: 1. Enhanced quality of photoresist films 2. Improved efficiency in substrate processing 3. Better control over the exposure environment

Commercial Applications: "Enhancing Photoresist Film Processing Efficiency with Humidified Ambient" technology can be utilized in industries such as semiconductor manufacturing, microelectronics fabrication, and photolithography processes to improve the quality and efficiency of substrate processing.

Questions about the Technology: 1. How does the humidifier impact the quality of the photoresist film on the substrate? 2. What are the potential cost savings associated with using this technology in substrate processing?

Original Abstract Submitted

a substrate processing apparatus includes a photoresist coater applying a photoresist film on a substrate, a humidifier increasing an amount of moisture in an ambient to which the photoresist film on the substrate is exposed, and an exposer irradiating the photoresist film exposed to the ambient having the increased amount of moisture with light. the humidifier is disposed between the photoresist coater and the exposer.