Samsung electronics co., ltd. (20240242985). SUBSTRATE PROCESSING APPARATUS, SUBSTRATE PROCESSING METHOD, AND METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE simplified abstract
SUBSTRATE PROCESSING APPARATUS, SUBSTRATE PROCESSING METHOD, AND METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE
Organization Name
Inventor(s)
Sangjine Park of Suwon-si (KR)
SUBSTRATE PROCESSING APPARATUS, SUBSTRATE PROCESSING METHOD, AND METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE - A simplified explanation of the abstract
This abstract first appeared for US patent application 20240242985 titled 'SUBSTRATE PROCESSING APPARATUS, SUBSTRATE PROCESSING METHOD, AND METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE
The substrate processing apparatus described in the abstract includes an index module with a load port for accommodating substrates, as well as first and second transfer modules for loading and unloading substrates, and a processing module with multiple process chambers for substrate processing.
- The processing module includes a light processing chamber that irradiates light onto a photoresist pattern on the substrate.
- The first transfer module moves substrates between the index module and the processing module.
- The second transfer module transfers substrates between the process chambers within the processing module.
- The first transfer module consists of a first hand unit and a second hand unit.
- The second transfer module comprises a third hand unit and a fourth hand unit.
Potential Applications: - Semiconductor manufacturing - Photolithography processes - Thin film deposition
Problems Solved: - Efficient substrate handling and processing - Precise light exposure for photoresist patterns - Streamlined production processes
Benefits: - Increased throughput and productivity - Enhanced accuracy in substrate processing - Reduction in manual handling errors
Commercial Applications: "Advanced Substrate Processing Apparatus for Semiconductor Manufacturing: Improving Efficiency and Precision in Thin Film Deposition and Photolithography Processes"
Questions about the technology: 1. How does the light processing chamber in the processing module improve substrate processing efficiency? 2. What are the key advantages of using multiple transfer modules in the substrate processing apparatus?
Original Abstract Submitted
provided is a substrate processing apparatus including an index module including a load port in which a substrate is accommodated, a first transfer module and a second transfer module for loading and unloading the substrate, and a processing module that is connected to the index module and includes a plurality of process chambers that process the substrate, wherein one of the plurality of process chambers includes a light processing chamber configured to irradiate light to a photoresist pattern of the substrate, the first transfer module transfers the substrate between the index module and the processing module, the second transfer module transfers the substrate between the plurality of process chambers in the processing module, the first transfer module includes a first hand unit and a second hand unit, and the second transfer module includes a third hand unit and a fourth hand unit.
