Samsung electronics co., ltd. (20240232051). METHOD AND DEVICE FOR FINDING CAUSALITY BETWEEN APPLICATION INSTRUMENTATION POINTS simplified abstract
Contents
METHOD AND DEVICE FOR FINDING CAUSALITY BETWEEN APPLICATION INSTRUMENTATION POINTS
Organization Name
Inventor(s)
Rohyoung Myung of Suwon-si (KR)
Hans Gustav Åhlman of Suwon-si (KR)
METHOD AND DEVICE FOR FINDING CAUSALITY BETWEEN APPLICATION INSTRUMENTATION POINTS - A simplified explanation of the abstract
This abstract first appeared for US patent application 20240232051 titled 'METHOD AND DEVICE FOR FINDING CAUSALITY BETWEEN APPLICATION INSTRUMENTATION POINTS
The abstract of the patent application describes an electronic device that can install instrumentation points in different tasks of an application to measure the causal relationship between them. This is done by observing delays induced by these instrumentation points.
- The electronic device includes one or more processors and a memory storing instructions.
- It installs instrumentation points in tasks of an application, including a source and target instrumentation point.
- The source and target tasks run in parallel on the processors.
- The device measures the causal relationship between the source and target instrumentation points based on observed delays.
Potential Applications: - Performance optimization in parallel computing systems - Debugging and troubleshooting software applications - Analyzing dependencies between tasks in distributed systems
Problems Solved: - Identifying causal relationships between tasks in parallel processing - Improving overall system efficiency and performance - Enhancing debugging capabilities in complex software applications
Benefits: - Increased understanding of task dependencies - Enhanced performance tuning and optimization - Streamlined debugging processes in parallel computing environments
Commercial Applications: Title: "Advanced Parallel Processing Performance Analyzer" This technology can be used in cloud computing platforms, data centers, and high-performance computing environments to optimize task execution and improve overall system efficiency.
Questions about the technology: 1. How does the electronic device determine the delay amount generated by the source instrumentation point?
- The device measures the delay in the target instrumentation point induced by the delay amount set by the source instrumentation point.
2. What are the key advantages of measuring causal relationships between tasks in parallel processing?
- Understanding these relationships can lead to better performance optimization and debugging processes in complex computing systems.
Original Abstract Submitted
an electronic device includes: one or more processors; a memory storing instructions configured to cause the one or more processors to: install instrumentation points in respective tasks of an application, the instrumentation points including a source instrumentation point installed in a source task and a target instrumentation point installed in a target task, wherein the source task and the target task are configured to execute in parallel on the one or more processors, and wherein each task includes a respective sequence of instructions executable by the one or more processors, and determine a measure of a causal relationship between the source instrumentation point and the target instrumentation point based on observation of a delay in the target instrumentation point induced by a delay amount generated by the source instrumentation point.
