Samsung electronics co., ltd. (20240230314). SEMICONDUCTOR MEASUREMENT APPARATUS simplified abstract
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SEMICONDUCTOR MEASUREMENT APPARATUS
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SEMICONDUCTOR MEASUREMENT APPARATUS - A simplified explanation of the abstract
This abstract first appeared for US patent application 20240230314 titled 'SEMICONDUCTOR MEASUREMENT APPARATUS
The semiconductor measurement apparatus described in the patent application includes components such as an illumination unit, an image sensor, an optical unit, and a control unit.
- The illumination unit irradiates light onto the sample, while the image sensor receives light reflected from the sample and outputs multiple interference images representing interference patterns of polarization components of light.
- The optical unit, which is in the path through which the image sensor receives light, includes an objective lens above the sample.
- The control unit processes the multi-interference image to obtain measurement parameters determined from the polarization components at each of a plurality of azimuth angles defined on a plane perpendicular to the path of light incident to the image sensor.
- The control unit can determine a selected critical dimension to be measured from a structure in the sample based on measurement parameters.
- The illumination unit and/or the optical unit may include a polarizer and a compensator with a ¼ wave plate.
Potential Applications: - This technology can be used in semiconductor manufacturing for precise measurement of critical dimensions in structures. - It can also be applied in quality control processes to ensure the accuracy and consistency of semiconductor components.
Problems Solved: - Provides a more accurate and efficient method for measuring critical dimensions in semiconductor structures. - Enables detailed analysis of polarization components of light for improved measurement accuracy.
Benefits: - Enhanced precision in semiconductor measurements. - Streamlined quality control processes in semiconductor manufacturing. - Improved understanding of interference patterns for better analysis of semiconductor structures.
Commercial Applications: Title: Advanced Semiconductor Measurement Apparatus for Precision Manufacturing This technology has significant commercial potential in the semiconductor industry for enhancing quality control processes and ensuring the accuracy of critical dimensions in semiconductor structures. It can be integrated into manufacturing facilities to improve production efficiency and product quality.
Questions about Semiconductor Measurement Apparatus: 1. How does the semiconductor measurement apparatus improve measurement accuracy in semiconductor manufacturing? The semiconductor measurement apparatus utilizes advanced techniques to analyze interference patterns of polarization components of light, allowing for precise measurement of critical dimensions in semiconductor structures.
2. What are the key components of the semiconductor measurement apparatus and how do they work together to achieve accurate measurements? The semiconductor measurement apparatus includes an illumination unit, image sensor, optical unit, and control unit. The illumination unit irradiates light onto the sample, the image sensor captures reflected light and generates interference images, the optical unit includes an objective lens for focusing light, and the control unit processes the images to determine measurement parameters.
Original Abstract Submitted
a semiconductor measurement apparatus may include an illumination unit configured to irradiate light to the sample, an image sensor configured to receive light reflected from the sample and output multiple interference images representing interference patterns of polarization components of light, an optical unit in a path through which the image sensor receives light and including an objective lens above the sample, and a control unit configured to obtain, by processing the multi-interference image, measurement parameters determined from the polarization components at each of a plurality of azimuth angles defined on a plane perpendicular to a path of light incident to the image sensor. the control unit may be configured to determine a selected critical dimension to be measured from a structure in the sample based on measurement parameters. the illumination unit and/or the optical unit may include a polarizer and a compensator having a � wave plate.
