Samsung electronics co., ltd. (20240219848). EXTREME ULTRAVIOLET EXPOSURE APPARATUS INCLUDING A MASK STAGE simplified abstract
Contents
EXTREME ULTRAVIOLET EXPOSURE APPARATUS INCLUDING A MASK STAGE
Organization Name
Inventor(s)
Seongchul Hong of Suwon-si (KR)
EXTREME ULTRAVIOLET EXPOSURE APPARATUS INCLUDING A MASK STAGE - A simplified explanation of the abstract
This abstract first appeared for US patent application 20240219848 titled 'EXTREME ULTRAVIOLET EXPOSURE APPARATUS INCLUDING A MASK STAGE
Simplified Explanation:
The patent application describes a mask stage with extreme ultraviolet mask attachment, fiducial mark, and measurement sensors to measure the energy of extreme ultraviolet light.
Key Features and Innovation:
- Mask stage with extreme ultraviolet mask attachment
- Fiducial mark for alignment
- Measurement sensors to measure energy of extreme ultraviolet light
- Sensors spaced apart from each other and support in scan direction
Potential Applications: This technology can be used in semiconductor manufacturing, lithography processes, and other industries requiring precise measurement of extreme ultraviolet light energy.
Problems Solved: This technology addresses the need for accurate measurement of extreme ultraviolet light energy in manufacturing processes.
Benefits:
- Improved accuracy in measuring extreme ultraviolet light energy
- Enhanced quality control in manufacturing processes
- Increased efficiency in semiconductor manufacturing
Commercial Applications: Title: Advanced Mask Stage Technology for Semiconductor Manufacturing This technology can be commercially used in semiconductor fabrication facilities, lithography equipment manufacturers, and companies involved in extreme ultraviolet light technology development.
Questions about Mask Stage Technology 1. How does the fiducial mark help in aligning the extreme ultraviolet mask attachment? 2. What are the specific industries that can benefit from this advanced mask stage technology?
Frequently Updated Research: Stay updated on the latest advancements in extreme ultraviolet light technology and semiconductor manufacturing processes to leverage the full potential of this innovative mask stage technology.
Original Abstract Submitted
a mask stage, including a body, a support on a lower surface of the body including an attachable extreme ultraviolet mask, a fiducial mark on the lower surface of the body and spaced apart from the support, and a sensor area including a plurality of measurement sensors configured to measure an energy of a portion of extreme ultraviolet light incident on the body, wherein the sensor area is on the lower surface of the body and is spaced apart from the support in a scan direction of the extreme ultraviolet light, and the plurality of measurement sensors are spaced apart from one another in a direction perpendicular to the scan direction.
