Samsung electronics co., ltd. (20240213055). PHOTORESIST COATING APPARATUS simplified abstract
Contents
PHOTORESIST COATING APPARATUS
Organization Name
Inventor(s)
Kyoungwhan Oh of Suwon-si (KR)
PHOTORESIST COATING APPARATUS - A simplified explanation of the abstract
This abstract first appeared for US patent application 20240213055 titled 'PHOTORESIST COATING APPARATUS
The patent application describes a photoresist coating apparatus that includes various components for handling photoresist in a manufacturing process.
- A photoresist trap tank temporarily stores the photoresist.
- A photoresist supply pipe is connected to the photoresist trap tank.
- A pump is connected to the photoresist supply pipe.
- A photoresist pressing device is connected to the photoresist supply pipe behind the pump.
- A photoresist circulation pipe is located behind the photoresist pressing device, connecting the photoresist supply pipe to the photoresist trap tank.
- A photoresist discharge pipe is connected to the photoresist supply pipe behind the photoresist circulation pipe.
- A photoresist discharge valve is connected to the photoresist discharge pipe.
- A photoresist discharge nozzle is connected to the photoresist discharge valve.
Potential Applications: - Semiconductor manufacturing - Printed circuit board production - Microelectronics industry
Problems Solved: - Efficient handling and circulation of photoresist - Precise application of photoresist in manufacturing processes
Benefits: - Improved accuracy and consistency in photoresist coating - Enhanced productivity and cost-effectiveness in manufacturing operations
Commercial Applications: Title: Advanced Photoresist Coating System for Semiconductor Manufacturing This technology can be utilized in semiconductor fabrication facilities to streamline the photoresist coating process, leading to higher quality products and increased production efficiency.
Questions about the technology: 1. How does the photoresist trap tank contribute to the overall efficiency of the coating process? - The photoresist trap tank serves as a temporary storage unit for the photoresist, allowing for smooth and continuous operation without interruptions. 2. What role does the photoresist pressing device play in ensuring precise application of the photoresist? - The photoresist pressing device helps to regulate the flow and pressure of the photoresist, ensuring uniform coating on the substrate.
Original Abstract Submitted
a photoresist coating apparatus includes a photoresist trap tank temporarily storing a photoresist. a photoresist supply pipe is connected to the photoresist trap tank. a pump is connected to the photoresist supply pipe. a photoresist pressing device is connected to the photoresist supply pipe at a rear of the pump. a photoresist circulation pipe is at a rear of the photoresist pressing device. the photoresist circulation pipe connects the photoresist supply pipe to the photoresist trap tank. a photoresist discharge pipe is connected to the photoresist supply pipe at a rear of the photoresist circulation pipe. a photoresist discharge valve is connected to the photoresist discharge pipe. a photoresist discharge nozzle is connected to the photoresist discharge valve.
