Samsung electronics co., ltd. (20240203714). PLASMA MONITORING SYSTEM simplified abstract
Contents
PLASMA MONITORING SYSTEM
Organization Name
Inventor(s)
Yunsong Jeong of Suwon-si (KR)
PLASMA MONITORING SYSTEM - A simplified explanation of the abstract
This abstract first appeared for US patent application 20240203714 titled 'PLASMA MONITORING SYSTEM
The abstract describes a plasma monitoring system used in semiconductor processes, featuring a chamber with an interior space and an optical window, a substrate stage, a light collecting device with light collectors, and a light analyzer with a spectrometer.
- The system includes a chamber for semiconductor processes with an optical window.
- A substrate stage supports the semiconductor substrate within the chamber.
- A light collecting device on the substrate stage collects light from the plasma through holes in its body.
- Light collectors transfer the collected light onto the optical window.
- A light analyzer with a spectrometer obtains an optical spectrum from the light on the optical window.
- The light analyzer maps the state of the plasma based on the optical spectrum and the positions of the through holes.
Potential Applications: - Semiconductor manufacturing processes - Plasma monitoring in research and development - Quality control in semiconductor production
Problems Solved: - Monitoring and analyzing plasma during semiconductor processes - Ensuring process efficiency and quality control - Enhancing understanding of plasma behavior in chambers
Benefits: - Improved process control and optimization - Real-time monitoring of plasma characteristics - Enhanced semiconductor production quality
Commercial Applications: Title: Plasma Monitoring System for Semiconductor Processes This technology can be used in semiconductor manufacturing facilities to enhance process control, optimize production, and ensure high-quality semiconductor products. The market implications include improved efficiency, reduced waste, and increased competitiveness in the semiconductor industry.
Questions about Plasma Monitoring System for Semiconductor Processes: 1. How does the light collecting device work in the plasma monitoring system? The light collecting device on the substrate stage collects light from the plasma through holes in its body, which is then transferred onto the optical window for analysis.
2. What are the key benefits of using a light analyzer with a spectrometer in this system? The light analyzer with a spectrometer allows for obtaining an optical spectrum from the light on the optical window, enabling the mapping of the plasma state and enhancing process control and optimization.
Original Abstract Submitted
a plasma monitoring system includes a chamber with an interior space, the chamber being configured to perform a semiconductor process on a semiconductor substrate using plasma in the interior space, and the chamber including an optical window, a substrate stage within the chamber to support the semiconductor substrate, a light collecting device on the substrate stage, the light collecting device including a body and light collectors, the body having through holes therethrough, and the light collectors being configured to collect light respectively incident on the through holes from the plasma and to transfer the collected lights onto the optical window, and a light analyzer including a spectrometer that is configured to obtain an optical spectrum from each light irradiated onto the optical window, and to map a state of the plasma from the optical spectrum to correspond to positions of the through holes.
