Samsung electronics co., ltd. (20240194733). SEMICONDUCTOR DEVICE AND METHOD OF FABRICATING THE SAME simplified abstract
Contents
SEMICONDUCTOR DEVICE AND METHOD OF FABRICATING THE SAME
Organization Name
Inventor(s)
Jae Young Choi of Suwon-si (KR)
SEMICONDUCTOR DEVICE AND METHOD OF FABRICATING THE SAME - A simplified explanation of the abstract
This abstract first appeared for US patent application 20240194733 titled 'SEMICONDUCTOR DEVICE AND METHOD OF FABRICATING THE SAME
The semiconductor device described in the patent application consists of various patterns and structures on a substrate, including active patterns, source/drain patterns, channel patterns, gate electrodes, and a power line.
- The active pattern on the substrate contains different regions with varying widths and sidewalls, including a recessed sidewall that connects the first and second sidewalls.
- The source/drain patterns on the active pattern consist of stacked semiconductor patterns.
- The gate electrodes are positioned on the channel patterns and extend parallel to each other in a specific direction.
- The power line is located adjacent to the active pattern and extends in a different direction from the other patterns.
Potential Applications: - This technology could be used in the manufacturing of advanced semiconductor devices for various electronic applications. - It may find applications in the development of high-performance integrated circuits and microprocessors.
Problems Solved: - The design of the semiconductor device addresses the need for efficient power distribution and signal processing in electronic devices. - The specific structure of the active pattern and its components contribute to improved performance and reliability of the device.
Benefits: - Enhanced functionality and performance of semiconductor devices. - Improved power distribution and signal processing capabilities. - Potential for increased efficiency and reliability in electronic systems.
Commercial Applications: Title: Advanced Semiconductor Device for Enhanced Performance in Electronic Systems This technology could be utilized in the production of smartphones, tablets, laptops, and other consumer electronics. It may also have applications in the automotive industry for advanced driver assistance systems and in the aerospace sector for communication and navigation systems.
Questions about the technology: 1. How does the unique structure of the active pattern contribute to the overall performance of the semiconductor device? 2. What are the potential implications of integrating this technology into various electronic applications?
Original Abstract Submitted
a semiconductor device includes an active pattern on a substrate, source/drain patterns on the active pattern, channel patterns on the active pattern and connected to the source/drain patterns each including stacked semiconductor patterns, gate electrodes on the channel patterns and extending in parallel to each other in a first direction, and a power line adjacent to the active pattern. the power line extends in a second direction. the active pattern includes a first region having a first width, a second region having a second width, and a third region between the first and second regions. the first region has a first sidewall extending in the second direction. the second region has a second sidewall extending in the second direction. the third region has a recessed sidewall that connects the first and second sidewalls. the recessed sidewall is recessed toward the power line.
