Samsung electronics co., ltd. (20240194488). METHOD FOR MANUFACTURING MASK PATTERN AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE USING THE MASK PATTERN simplified abstract
Contents
- 1 METHOD FOR MANUFACTURING MASK PATTERN AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE USING THE MASK PATTERN
- 1.1 Organization Name
- 1.2 Inventor(s)
- 1.3 METHOD FOR MANUFACTURING MASK PATTERN AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE USING THE MASK PATTERN - A simplified explanation of the abstract
- 1.4 Simplified Explanation
- 1.5 Key Features and Innovation
- 1.6 Potential Applications
- 1.7 Problems Solved
- 1.8 Benefits
- 1.9 Commercial Applications
- 1.10 Prior Art
- 1.11 Frequently Updated Research
- 1.12 Questions about Mask Pattern Manufacturing
- 1.13 Original Abstract Submitted
METHOD FOR MANUFACTURING MASK PATTERN AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE USING THE MASK PATTERN
Organization Name
Inventor(s)
METHOD FOR MANUFACTURING MASK PATTERN AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE USING THE MASK PATTERN - A simplified explanation of the abstract
This abstract first appeared for US patent application 20240194488 titled 'METHOD FOR MANUFACTURING MASK PATTERN AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE USING THE MASK PATTERN
Simplified Explanation
The patent application describes a method for manufacturing a mask pattern by forming trenches of different widths on a substrate using a series of mask layers.
Key Features and Innovation
- Formation of trenches of varying widths on a substrate.
- Sequential etching of mask layers to create the desired pattern.
- Removal of the mold mask layer to leave the final process mask pattern on the substrate.
Potential Applications
This technology can be used in semiconductor manufacturing, photolithography processes, and microfabrication industries.
Problems Solved
- Precision patterning of masks on substrates.
- Efficient creation of intricate mask patterns.
- Simplification of the manufacturing process.
Benefits
- Enhanced control over mask pattern formation.
- Improved accuracy in mask fabrication.
- Cost-effective manufacturing method.
Commercial Applications
Mask Pattern Manufacturing for Semiconductor Industry
This technology can revolutionize the production of semiconductor devices by enabling the creation of precise mask patterns with ease.
Prior Art
Prior research in the field of photolithography and microfabrication techniques may provide insights into similar methods of mask pattern manufacturing.
Frequently Updated Research
Researchers are constantly exploring new techniques and materials to enhance mask pattern manufacturing processes. Stay updated on the latest advancements in the field.
Questions about Mask Pattern Manufacturing
What are the key advantages of using trenches of varying widths in mask pattern manufacturing?
Using trenches of different widths allows for the creation of complex and detailed mask patterns with high precision.
How does the sequential etching of mask layers contribute to the final mask pattern formation process?
Sequential etching of mask layers enables the gradual creation of intricate patterns on the substrate, leading to accurate mask fabrication.
Original Abstract Submitted
a method for manufacturing a mask pattern includes forming a mold mask layer on a substrate. a pre-mold mask pattern that includes a first trench extending in a first direction is formed by etching the mold mask layer. the first trench has a first width in a second direction crossing the first direction. a mold mask pattern that includes a second trench connected to the first trench is formed by etching the pre-mold mask pattern. the second trench has a second width different from the first width in the second direction. the second trench is adjacent to the first trench in the first direction. a process mask pattern that fills the first and second trenches is formed in the mold mask pattern and disposed on the substrate. the mold mask pattern is removed and the process mask pattern remains disposed on the substrate after removing the mold mask pattern.
