Samsung electronics co., ltd. (20240192604). POST BAKING APPARATUS simplified abstract

POST BAKING APPARATUS

Organization Name

samsung electronics co., ltd.

Inventor(s)

Jaehong Lim of Suwon-si (KR)

Youngho Hwang of Suwon-si (KR)

Byungjo Kim of Suwon-si (KR)

Sangki Nam of Suwon-si (KR)

Suyoung Yoo of Suwon-si (KR)

Sanghyun Lim of Suwon-si (KR)

Youngkyun Im of Suwon-si (KR)

Hyungkyu Choi of Suwon-si (KR)

Seok Heo of Suwon-si (KR)

POST BAKING APPARATUS - A simplified explanation of the abstract

This abstract first appeared for US patent application 20240192604 titled 'POST BAKING APPARATUS

The patent application describes a post-baking apparatus for substrates with exposed photoresist film, featuring a lower heater, an applier of electric or magnetic fields, and a controller.

• The apparatus includes a baking chamber for substrates with exposed photoresist film.
• A lower heater is positioned in the baking chamber beneath the substrate to heat the exposed photoresist film.
• An applier applies an electric or magnetic field to the exposed photoresist film in a vertical direction to control diffusions of acid or secondary electrons along a horizontal direction.
• The controller is responsible for managing the operation of the applier.

Potential Applications: - Semiconductor manufacturing processes - Photolithography applications - Microelectronics fabrication

Problems Solved: - Controlling diffusions of acid or secondary electrons in photoresist films - Enhancing precision and quality in semiconductor manufacturing

Benefits: - Improved accuracy in patterning processes - Enhanced efficiency in microelectronics fabrication - Reduced defects in semiconductor devices

Commercial Applications: Title: Advanced Semiconductor Manufacturing Equipment This technology can be utilized in the production of high-performance semiconductor devices, catering to the growing demand for advanced electronics in various industries.

Prior Art: Researchers can explore patents related to photoresist film processing, semiconductor manufacturing equipment, and precision control systems in microelectronics.

Frequently Updated Research: Ongoing studies focus on optimizing the application of electric and magnetic fields in photoresist film processing, as well as enhancing the efficiency of post-baking processes in semiconductor manufacturing.

Questions about Post-Baking Apparatus: 1. How does the applier control diffusions of acid or secondary electrons in the photoresist film? 2. What are the key advantages of using electric or magnetic fields in post-baking processes for substrates with exposed photoresist film?

Original Abstract Submitted

a post baking apparatus comprising a baking chamber configured to receive a substrate with an exposed photoresist film, a lower heater in the baking chamber under the substrate to heat the exposed photoresist film, an applier applying an electric field or a magnetic field to the exposed photoresist film along a vertical direction, which is substantially perpendicular to an upper surface of the exposed photoresist film, to control diffusions of an acid or a secondary electron, which are generated from the exposed photoresist film, along a horizontal direction, and a controller configured to control an operation of the applier.