Samsung electronics co., ltd. (20240118072). LEVEL SENSOR AND SUBSTRATE PROCESSING APPARATUS INCLUDING THE SAME simplified abstract

LEVEL SENSOR AND SUBSTRATE PROCESSING APPARATUS INCLUDING THE SAME

Organization Name

samsung electronics co., ltd.

Inventor(s)

Sungho Jang of Suwon-si (KR)

Sangwoo Bae of Suwon-si (KR)

Minhwan Seo of Suwon-si (KR)

Jangwoon Sung of Suwon-si (KR)

Akinori Okubo of Suwon-si (KR)

Seungwoo Lee of Suwon-si (KR)

Jungchul Lee of Suwon-si (KR)

Jaehwang Jung of Suwon-si (KR)

Sangjoon Hong of Suwon-si (KR)

LEVEL SENSOR AND SUBSTRATE PROCESSING APPARATUS INCLUDING THE SAME - A simplified explanation of the abstract

This abstract first appeared for US patent application 20240118072 titled 'LEVEL SENSOR AND SUBSTRATE PROCESSING APPARATUS INCLUDING THE SAME

Simplified Explanation

The patent application describes a level sensor used to detect the height level of a substrate in a substrate processing apparatus. The sensor includes a measurement light source, a prism, an optical path length modulator, and a detector to detect the optical path length difference between polarized lights.

• Measurement light source radiates light towards the substrate.
• Prism splits reflected light into polarized lights with different optical path lengths.
• Optical path length modulator keeps one path constant and periodically changes the other.
• Detector detects the optical path length difference through interference signals.

Potential Applications

The technology can be used in various industries such as semiconductor manufacturing, pharmaceuticals, and food processing for accurate level detection and control.

Problems Solved

The level sensor solves the problem of accurately measuring the height level of a substrate in a processing apparatus, ensuring precise and consistent results.

Benefits

The benefits of this technology include improved process control, increased efficiency, reduced waste, and enhanced product quality.

Potential Commercial Applications

One potential commercial application of this technology is in the semiconductor industry for wafer processing equipment, where precise level detection is crucial for quality control and yield optimization.

Possible Prior Art

One possible prior art for this technology could be traditional level sensors using ultrasonic or capacitive methods for substrate height detection.

How does the level sensor handle variations in substrate material properties?

The level sensor may need to be calibrated or adjusted based on the specific properties of the substrate material to ensure accurate height level detection.

What is the maintenance required for the level sensor to ensure long-term reliability?

Regular cleaning and calibration of the components, such as the prism and optical path length modulator, may be necessary to maintain the sensor's accuracy and performance over time.

Original Abstract Submitted

provided are a level sensor configured to detect a height level of a substrate, and a substrate processing apparatus including the level sensor. the level sensor includes a measurement light source configured to radiate measurement light toward the substrate, a prism configured to split reflected light of the measurement light into first polarized light and second polarized light and generate a first optical path length difference between the first polarized light and the second polarized light, an optical path length modulator configured to keep constant an optical path length of the first polarized light and periodically change an optical path length of the second polarized light, and a detector configured to detect the first optical path length difference based on an interference signal between the first polarized light and the second polarized light.