Samsung electronics co., ltd. (20240114700). SEMICONDUCTOR DEVICE simplified abstract
Contents
- 1 SEMICONDUCTOR DEVICE
SEMICONDUCTOR DEVICE
Organization Name
Inventor(s)
SEMICONDUCTOR DEVICE - A simplified explanation of the abstract
This abstract first appeared for US patent application 20240114700 titled 'SEMICONDUCTOR DEVICE
Simplified Explanation
The semiconductor device described in the patent application includes cell lower conductive lines and peripheral lower conductive lines on a substrate, lower electrode contacts on the cell lower conductive lines, peripheral conductive contacts on the peripheral lower conductive lines, and variable resistance patterns horizontally spaced apart from each other on the lower electrode contacts. The lower electrode contacts are connected to the variable resistance patterns, while the peripheral conductive lines are horizontally spaced apart from the variable resistance patterns on the peripheral conductive contacts. The cell and peripheral lower conductive lines are connected to the lower electrode contacts and the peripheral conductive contacts, respectively, and are at the same height. The pitch of the cell lower conductive lines directly adjacent to each other is greater than the pitch of the peripheral lower conductive lines directly adjacent to each other.
- Cell lower conductive lines and peripheral lower conductive lines on a substrate
- Lower electrode contacts on the cell lower conductive lines
- Peripheral conductive contacts on the peripheral lower conductive lines
- Variable resistance patterns on the lower electrode contacts
- Cell and peripheral lower conductive lines connected to respective contacts
- Different pitches for cell and peripheral lower conductive lines
Potential Applications
The technology described in the patent application could be applied in:
- Memory devices
- Logic circuits
- Sensor devices
Problems Solved
This technology helps in:
- Increasing device performance
- Enhancing memory storage capacity
- Improving circuit efficiency
Benefits
The benefits of this technology include:
- Higher speed operation
- Increased data storage capabilities
- Enhanced overall device performance
Potential Commercial Applications
The technology could find commercial applications in:
- Semiconductor manufacturing companies
- Electronics industry
- Research institutions
Possible Prior Art
One possible prior art for this technology could be:
- Similar semiconductor devices with variable resistance patterns
What is the manufacturing process for this semiconductor device?
The manufacturing process for this semiconductor device involves creating cell and peripheral lower conductive lines on a substrate, depositing lower electrode contacts on the cell lines, adding peripheral conductive contacts on the peripheral lines, and placing variable resistance patterns on the lower electrode contacts.
How does the pitch of the cell lower conductive lines affect the overall performance of the device?
The pitch of the cell lower conductive lines directly impacts the density and efficiency of the device. A greater pitch allows for more space between the lines, reducing interference and improving signal transmission within the device.
Original Abstract Submitted
a semiconductor device includes cell lower conductive lines and peripheral lower conductive lines on a substrate, lower electrode contacts on the cell lower conductive lines, peripheral conductive contacts on the peripheral lower conductive lines, variable resistance patterns horizontally spaced apart from each other on the lower electrode contacts. the lower electrode contacts are respectively connected to the variable resistance patterns. peripheral conductive lines are horizontally spaced apart from the variable resistance patterns on the peripheral conductive contacts. the peripheral conductive contacts are connected to the peripheral conductive lines. the cell and peripheral lower conductive lines are connected to the lower electrode contacts and the peripheral conductive contacts, respectively. the cell and peripheral lower conductive lines are at the same height. a pitch of the cell lower conductive lines directly adjacent to each other is greater than a pitch of the peripheral lower conductive lines directly adjacent to each other.
