Samsung display co., ltd. (20240324285). DISPLAY APPARATUS AND METHOD OF MANUFACTURING THE SAME simplified abstract
Contents
DISPLAY APPARATUS AND METHOD OF MANUFACTURING THE SAME
Organization Name
Inventor(s)
Kohei Ebisuno of Yongin-si (KR)
DISPLAY APPARATUS AND METHOD OF MANUFACTURING THE SAME - A simplified explanation of the abstract
This abstract first appeared for US patent application 20240324285 titled 'DISPLAY APPARATUS AND METHOD OF MANUFACTURING THE SAME
The abstract describes a display apparatus and a manufacturing method that prevent electrical shorting caused by protrusion structures resulting from different etch rates. The display apparatus includes a substrate, a semiconductor layer, a first metal layer with a lower etch rate, and a second metal layer with an even lower etch rate.
- The display apparatus includes a substrate, semiconductor layer, first metal layer, and second metal layer.
- The first metal layer has a lower etch rate under a predetermined condition.
- The second metal layer has an even lower etch rate than the first metal layer.
- The second metal layer is arranged on the first metal layer and contacts its upper surface.
- The second metal layer is made of a different metal material than the first metal layer.
Potential Applications: - This technology can be used in the manufacturing of display panels for electronic devices. - It can also be applied in the production of semiconductor devices to prevent electrical shorting.
Problems Solved: - Prevents electrical shorting caused by protrusion structures due to different etch rates. - Ensures the reliability and functionality of display apparatus and semiconductor devices.
Benefits: - Improved reliability and performance of display panels and semiconductor devices. - Enhanced manufacturing process efficiency by avoiding electrical shorting issues.
Commercial Applications: - Display panel manufacturing industry - Semiconductor device production sector
Questions about the technology: 1. How does the technology prevent electrical shorting in display apparatus and semiconductor devices? - The technology utilizes metal layers with different etch rates to prevent protrusion structures that can cause electrical shorting.
2. What are the key advantages of using a second metal layer with a lower etch rate in the display apparatus? - The second metal layer helps to avoid electrical shorting by reducing the likelihood of protrusion structures forming.
Original Abstract Submitted
a display apparatus and a manufacturing method may avoid electrical shorting caused by protrusion structures that result from a difference in etch rates. the display apparatus includes a substrate, a semiconductor layer on the substrate, a first metal layer arranged on the semiconductor layer, insulated from the semiconductor layer, and including a first metal layer having a first etch rate under a predetermined condition, and a second metal layer arranged on the first metal layer, contacting an upper surface of the first metal layer, including a second metal material having a second etch rate under the predetermined condition, the second etch rate being less than the first etch rate, and arranged in the upper surface of the first metal layer when viewed in a direction perpendicular to the substrate.
