Samsung display co., ltd. (20240324280). METHOD OF MANUFACTURING DISPLAY APPARATUS simplified abstract
Contents
METHOD OF MANUFACTURING DISPLAY APPARATUS
Organization Name
Inventor(s)
Sukyoung Yang of Yongin-si (KR)
Joonyong Park of Yongin-si (KR)
Hyuneok Shin of Yongin-si (KR)
METHOD OF MANUFACTURING DISPLAY APPARATUS - A simplified explanation of the abstract
This abstract first appeared for US patent application 20240324280 titled 'METHOD OF MANUFACTURING DISPLAY APPARATUS
The method of manufacturing a display apparatus involves several steps:
- Forming a subpixel electrode
- Forming a conductive bank layer with a first opening overlapping the subpixel electrode
- Creating an insulating layer with an opening overlapping the first opening
- Forming an intermediate layer and an opposite electrode overlapping the subpixel electrode
- Applying an inorganic passivation layer-forming material on the opposite electrode and the conductive bank layer
- Depositing a first metal layer and a second metal layer on a portion of the passivation layer-forming material
- Etching the passivation layer to form an inorganic passivation layer using the metal layers as masks
Potential Applications: - This technology can be used in the manufacturing of high-resolution displays for electronic devices such as smartphones, tablets, and televisions.
Problems Solved: - This method allows for the creation of intricate display structures with improved durability and performance.
Benefits: - Enhanced display quality and longevity - Increased efficiency in manufacturing processes
Commercial Applications: - The technology can be applied in the consumer electronics industry to produce cutting-edge display screens for a wide range of devices.
Questions about the technology: 1. How does this method improve the overall quality of display screens? 2. What are the specific advantages of using inorganic passivation layers in display manufacturing?
Original Abstract Submitted
a method of manufacturing a display apparatus includes: forming a subpixel electrode; forming a conductive bank layer including a first opening overlapping the subpixel electrode, disposed over the subpixel electrode; forming an insulating layer between a peripheral portion of the subpixel electrode and the conductive bank layer and including an opening overlapping the first opening; forming an intermediate layer overlapping the subpixel electrode; forming an opposite electrode overlapping the subpixel electrode; continuously arranging an inorganic passivation layer-forming material on the opposite electrode and the conductive bank layer; forming, on a portion of the inorganic passivation layer-forming material, a first metal layer and a second metal layer, which overlap the first opening; and forming an inorganic passivation layer by etching a portion of the inorganic passivation layer-forming material, which does not overlap the first metal layer and the second metal layer, by using the first and second metal layers as masks.
