Samsung display co., ltd. (20240306421). DISPLAY DEVICE AND METHOD OF MANUFACTURING THE SAME simplified abstract
Contents
DISPLAY DEVICE AND METHOD OF MANUFACTURING THE SAME
Organization Name
Inventor(s)
SOONMI Choi of Cheonan-si (KR)
DISPLAY DEVICE AND METHOD OF MANUFACTURING THE SAME - A simplified explanation of the abstract
This abstract first appeared for US patent application 20240306421 titled 'DISPLAY DEVICE AND METHOD OF MANUFACTURING THE SAME
The abstract of the patent application describes a display device with a thin film encapsulation layer containing silicon oxynitride and an organic layer, where a portion of the inorganic layer has a stress intensity factor of about 1.6 MPa or more.
- Simplified Explanation:
The patent application is for a display device that has a thin film encapsulation layer with specific stress intensity factors.
- Key Features and Innovation:
- Display device with a light emitting structure on a substrate. - Thin film encapsulation layer with silicon oxynitride and an organic layer. - Inorganic layer with stress intensity factor of 1.6 MPa or more.
- Potential Applications:
- Consumer electronics - Automotive displays - Medical devices
- Problems Solved:
- Improved durability of display devices - Enhanced protection for light emitting structures
- Benefits:
- Increased longevity of display devices - Better performance in various environments
- Commercial Applications:
- Display technology for smartphones, tablets, and TVs - Automotive display systems - Medical imaging devices
- Questions about Display Devices:
1. How does the stress intensity factor impact the performance of the display device? - The stress intensity factor affects the durability and reliability of the display device.
2. What are the potential drawbacks of using silicon oxynitride in the encapsulation layer? - Silicon oxynitride may have limitations in extreme temperature or humidity conditions.
- Frequently Updated Research:
- Ongoing research on improving the efficiency and lifespan of display devices.
Original Abstract Submitted
a display device includes a light emitting structure disposed on a substrate, and a thin film encapsulation layer disposed on the light emitting structure and including an inorganic layer containing silicon oxynitride and an organic layer. a portion of the inorganic layer has a stress intensity factor of about 1.6 mpa or more.
