Samsung display co., ltd. (20240290590). PLASMA MONITORING SYSTEM simplified abstract
Contents
PLASMA MONITORING SYSTEM
Organization Name
Inventor(s)
YOUNGGIL Park of Yongin-si (KR)
PLASMA MONITORING SYSTEM - A simplified explanation of the abstract
This abstract first appeared for US patent application 20240290590 titled 'PLASMA MONITORING SYSTEM
Simplified Explanation: The patent application describes a plasma monitoring system that includes a gate valve, a viewport structure with light transmitting parts, and an optical emission spectroscopy system for monitoring plasma.
- The system has a gate valve that controls access to the chamber where plasma monitoring takes place.
- A viewport structure outside the chamber has multiple light transmitting parts.
- An optical emission spectroscopy system outside the chamber monitors plasma by receiving light transmitted through the light transmitting parts of the viewport structure.
Key Features and Innovation:
- Integration of a gate valve for controlling access to the plasma monitoring chamber.
- Use of a viewport structure with light transmitting parts for external observation.
- Implementation of optical emission spectroscopy for monitoring plasma.
Potential Applications: The technology can be applied in industries where plasma monitoring is crucial, such as semiconductor manufacturing, plasma etching, and thin film deposition.
Problems Solved: The system addresses the need for real-time monitoring of plasma processes and provides a convenient way to observe plasma without direct exposure to the chamber.
Benefits:
- Enhanced safety by allowing monitoring from outside the chamber.
- Improved efficiency in plasma processes through real-time monitoring.
- Potential for better control and optimization of plasma parameters.
Commercial Applications: Title: Plasma Monitoring System for Industrial Applications This technology can be utilized in semiconductor fabrication plants, research laboratories, and other industrial settings where plasma processes are employed. It can improve process control, efficiency, and safety.
Prior Art: Readers can explore prior art related to plasma monitoring systems, gate valves, viewport structures, and optical emission spectroscopy in the field of plasma physics and industrial process monitoring.
Frequently Updated Research: Researchers are continually exploring advancements in optical emission spectroscopy, plasma diagnostics, and process monitoring technologies that could enhance the capabilities of this plasma monitoring system.
Questions about Plasma Monitoring Systems: 1. What are the key components of a plasma monitoring system? 2. How does optical emission spectroscopy contribute to plasma monitoring?
Original Abstract Submitted
a plasma monitoring system includes a gate valve disposed on a first side of a chamber, where the gate valve is opened or closed in conjunction with a plasma monitoring operation, a viewport structure disposed outside the chamber and including a plurality of light transmitting parts, and an optical emission spectroscopy disposed outside the chamber, where the optical emission spectroscopy monitors plasma by receiving plasma light transmitted through at least one of the plurality of light transmitting parts of the viewport structure.
