Samsung display co., ltd. (20240263309). ATOMIC LAYER DEPOSITION APPARATUS simplified abstract
Contents
ATOMIC LAYER DEPOSITION APPARATUS
Organization Name
Inventor(s)
WOO-SEOK Jeon of Yongin-si (KR)
ATOMIC LAYER DEPOSITION APPARATUS - A simplified explanation of the abstract
This abstract first appeared for US patent application 20240263309 titled 'ATOMIC LAYER DEPOSITION APPARATUS
The abstract describes an atomic layer deposition apparatus that includes various components for supplying source gases, reaction gases, and purge gases in a controlled manner.
- Source gas supply part supplies multiple source gases
- Source gas supply module connected to the source gas supply part
- Reaction gas supply part supplies a reaction gas
- Reaction gas supply module connected to the reaction gas supply part
- First purge gas supply module disposed between the source gas supply module and the reaction gas supply module
Potential Applications: - Thin film deposition in semiconductor manufacturing - Coating of various materials for improved performance - Surface modification for enhanced properties in medical devices
Problems Solved: - Precise control of gas supply for atomic layer deposition - Minimization of contamination during the deposition process - Improved uniformity and consistency in thin film coatings
Benefits: - Enhanced quality and performance of thin films - Increased efficiency in deposition processes - Reduction in material waste and cost savings
Commercial Applications: Title: "Advanced Atomic Layer Deposition Apparatus for Precision Coating Applications" This technology can be utilized in industries such as semiconductor manufacturing, electronics, optics, and medical device production. The precise control of gas supply and deposition process can lead to improved product quality and performance, making it a valuable tool for companies seeking high-quality coatings.
Questions about Atomic Layer Deposition: 1. How does the atomic layer deposition process differ from other thin film deposition techniques? - Answer: Atomic layer deposition is a layer-by-layer deposition process that allows for precise control of film thickness and composition, resulting in highly uniform and conformal coatings.
2. What are the key factors to consider when selecting source gases for atomic layer deposition? - Answer: Source gases must be compatible with the deposition process, have high purity levels, and be easily controllable to achieve the desired film properties.
Original Abstract Submitted
an atomic layer deposition apparatus includes a source gas supply part that supplies multiple source gases, a source gas supply module connected to the source gas supply part, a reaction gas supply part that supplies a reaction gas, a reaction gas supply module connected to the reaction gas supply part and spaced apart from the source gas supply module in a first direction, and a first purge gas supply module disposed between the source gas supply module and the reaction gas supply module.
