Samsung display co., ltd. (20240192583). PHOTOMASK INCLUDING MONITORING MARK simplified abstract
Contents
PHOTOMASK INCLUDING MONITORING MARK
Organization Name
Inventor(s)
Yoon Yeol Lee of Yongin-si (KR)
PHOTOMASK INCLUDING MONITORING MARK - A simplified explanation of the abstract
This abstract first appeared for US patent application 20240192583 titled 'PHOTOMASK INCLUDING MONITORING MARK
The patent application describes a photomask with a monitoring mark that includes multiple test patterns defined as openings on the base and pattern layer.
- The monitoring mark includes first through n-th test patterns, each with two edges facing each other in different directions.
- The spacing between the edges of the test patterns is constant along the second direction, determined by the formula (kn+j) times a unit width.
- The innovation allows for precise monitoring and alignment of the photomask during manufacturing processes.
Potential Applications:
- Semiconductor manufacturing
- Microelectronics industry
- Optical lithography processes
Problems Solved:
- Ensures accurate alignment of the photomask layers
- Improves quality control in manufacturing processes
Benefits:
- Enhanced precision in photomask fabrication
- Increased efficiency in semiconductor production
- Cost-effective monitoring solution
Commercial Applications:
- Photomask manufacturing companies
- Semiconductor fabrication facilities
- Research institutions in microelectronics
Prior Art: Prior art related to this technology may include patents or research papers on photomask monitoring and alignment techniques in semiconductor manufacturing.
Frequently Updated Research: Stay updated on advancements in photomask technology, semiconductor manufacturing processes, and quality control methods in the microelectronics industry.
Questions about Photomask Monitoring Mark: 1. How does the monitoring mark improve the accuracy of photomask fabrication? 2. What are the potential implications of this technology for the semiconductor industry?
Original Abstract Submitted
a photomask includes: a base, a pattern layer disposed on the base, and a monitoring mark including a first sub-monitoring mark which includes a plurality of test patterns defined as openings penetrating the base and the pattern layer. the first sub-monitoring mark includes first through n-th test patterns, each of the first through n-th test patterns includes a first edge and a second edge extending along a first direction and facing each other along a second direction different from the first direction, the second edge of a j-th test pattern among the first through n-th test patterns is spaced apart from the first edge of the j-th test pattern along the second direction by (kn+j) times a unit width that is constant along the second direction, and n is a natural number more than 1, j is a natural number from 1 to n, and k is a natural number.
