Microsoft Technology Licensing, LLC (20240298550). PROGRESSIVE THERMAL DRYING CHAMBER FOR QUANTUM CIRCUITS simplified abstract

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PROGRESSIVE THERMAL DRYING CHAMBER FOR QUANTUM CIRCUITS

Organization Name

Microsoft Technology Licensing, LLC

Inventor(s)

Quang Thanh Tran of San Jose CA (US)

Judith Cutaran Aarts of San Jose CA (US)

John S. Hickman of Reno NV (US)

Thanh Cong Dinh of San Jose CA (US)

PROGRESSIVE THERMAL DRYING CHAMBER FOR QUANTUM CIRCUITS - A simplified explanation of the abstract

This abstract first appeared for US patent application 20240298550 titled 'PROGRESSIVE THERMAL DRYING CHAMBER FOR QUANTUM CIRCUITS

The abstract describes techniques for progressively thermally drying a quantum circuit using a combination of heated inert gas and ambient air.

  • Inert gas is heated by a heater element to create a heated inert gas.
  • The heated ambient air and heated inert gas mix in a heating channel before flowing into a probe compartment to dry the quantum circuit.
  • The flow rate of the inert gas is controlled to maintain a relative humidity below a set threshold.
  • The temperature of the heater element is adjusted to reach a progressively increasing target temperature with a tolerance of 3.0°C.
  • Heating of the inert gas is triggered by its detection, and the flow and heating are automatically stopped.

Potential Applications: - Semiconductor manufacturing - Electronics industry - Research laboratories

Problems Solved: - Efficiently drying quantum circuits - Controlling humidity levels - Ensuring precise temperature control

Benefits: - Improved performance of quantum circuits - Enhanced reliability of electronic components - Streamlined manufacturing processes

Commercial Applications: Title: Advanced Thermal Drying System for Quantum Circuits This technology can be used in semiconductor fabrication facilities, electronics manufacturing plants, and research institutions to enhance the quality and reliability of electronic components.

Questions about the technology: 1. How does the combination of heated inert gas and ambient air help in drying quantum circuits? 2. What are the key advantages of using this thermal drying system for quantum circuits?


Original Abstract Submitted

techniques are described herein that are capable of progressively thermally drying a quantum circuit. an inert gas is progressively heated by a heater element to provide a heated inert gas. heated ambient air and the heated inert gas combine in a heating channel, causing a combination of the heated ambient air and the heated inert gas to flow into a probe compartment to progressively thermally dry a quantum circuit therein. a flow rate of the inert gas is controlled to cause the combination to have a relative humidity less than or equal to a threshold. a temperature of the heater element may be controlled to be approximately equal to a progressively increasing target temperature within a tolerance of 3.0� c. heating of the inert gas may be initiated based on detection of the inert gas, and the flow and heating of the inert gas may be automatically discontinued.

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