Micron technology, inc. (20240313125). DEVICES INCLUDING CHANNEL MATERIALS AND PASSIVATION MATERIALS simplified abstract
Contents
DEVICES INCLUDING CHANNEL MATERIALS AND PASSIVATION MATERIALS
Organization Name
Inventor(s)
Kamal M. Karda of Boise ID (US)
DEVICES INCLUDING CHANNEL MATERIALS AND PASSIVATION MATERIALS - A simplified explanation of the abstract
This abstract first appeared for US patent application 20240313125 titled 'DEVICES INCLUDING CHANNEL MATERIALS AND PASSIVATION MATERIALS
The abstract describes a microelectronic device with a transistor that has a channel material extending into a conductive line in three dimensions. The device also includes a dielectric material, a conductive material, a passivation material, and a conductive contact adjacent to the channel material.
- The transistor in the microelectronic device has a unique design with the channel material contacting the conductive line in three dimensions.
- The device includes various materials such as dielectric, conductive, and passivation materials to enhance its performance.
- The conductive contact adjacent to the channel material plays a crucial role in the functionality of the device.
- The innovative design of the transistor and its components sets this microelectronic device apart from others in the market.
- This technology offers improved efficiency and performance in microelectronic devices.
Potential Applications: - This technology can be used in the manufacturing of advanced microelectronic devices. - It can be applied in various electronic devices requiring high performance and efficiency.
Problems Solved: - Enhances the performance and efficiency of microelectronic devices. - Provides a unique design for transistors that improves functionality.
Benefits: - Improved performance and efficiency in microelectronic devices. - Enhanced design for transistors leading to better functionality.
Commercial Applications: Title: Advanced Microelectronic Devices: Commercial Uses and Market Implications This technology can be utilized in the production of high-performance electronic devices, leading to increased market competitiveness and consumer demand.
Questions about Microelectronic Device Innovation: 1. How does the unique design of the transistor in this microelectronic device improve its performance? 2. What are the specific advantages of the conductive contact adjacent to the channel material in this technology?
Frequently Updated Research: Stay updated on the latest advancements in microelectronic device technology to ensure you are leveraging the most innovative solutions for your electronic devices.
Original Abstract Submitted
a microelectronic device comprises a conductive line and a transistor adjacent to the conductive line. the transistor comprises a channel material extending into the conductive line, the channel material contacting the conductive line in three dimensions, a dielectric material adjacent to the channel material, a conductive material adjacent to the dielectric material, and a passivation material adjacent to the channel material. the microelectronic device further comprises a conductive contact adjacent to the channel material, the conductive contact including a portion extending between opposing portions of the channel material. related microelectronic devices, electronic devices, and related methods are also disclosed.
