Intel corporation (20240264530). LIGHT RESPONSIVE PHOTORESISTS AND METHODS simplified abstract
LIGHT RESPONSIVE PHOTORESISTS AND METHODS
Organization Name
Inventor(s)
Ryan Carrazzone of Chandler AZ (US)
Kyle Arrington of Gilbert AZ (US)
Brandon Rawlings of Chandler AZ (US)
Bohan Shan of Chandler AZ (US)
Dingying Xu of Chandler AZ (US)
LIGHT RESPONSIVE PHOTORESISTS AND METHODS - A simplified explanation of the abstract
This abstract first appeared for US patent application 20240264530 titled 'LIGHT RESPONSIVE PHOTORESISTS AND METHODS
The abstract describes light-responsive photoresists that contain a polymer with a photocleavable group. When exposed to specific wavelengths of light, the polymer depolymerizes, producing gas-phase products.
- Light-responsive photoresists with a polymer featuring a photocleavable group
- Depolymerization of the polymer when irradiated with light
- Production of gas-phase products as a result of depolymerization
Potential Applications: - Lithography processes - Microfabrication - Semiconductor manufacturing
Problems Solved: - Enhanced precision in patterning processes - Improved control over material removal
Benefits: - Increased efficiency in manufacturing processes - Reduced material waste - Enhanced resolution in patterned structures
Commercial Applications: Title: "Innovative Light-Responsive Photoresists for Advanced Lithography Processes" This technology can be utilized in the semiconductor industry, microelectronics manufacturing, and research institutions focusing on nanotechnology.
Questions about Light-Responsive Photoresists: 1. How do light-responsive photoresists improve the efficiency of lithography processes? 2. What are the key advantages of using polymers with photocleavable groups in photoresists?
Original Abstract Submitted
light responsive photoresists, and methods of using light responsive photoresists in processes, such as lithography processes. the light responsive photoresists may include a polymer featuring a photocleavable group. due to the photocleavable group, the polymer may depolymerize when irradiated with one or more wavelengths of light. the depolymerized products may be in the gas phase.