Intel corporation (20240194548). APPARATUS AND METHOD FOR ELECTROLESS SURFACE FINISHING ON GLASS simplified abstract

APPARATUS AND METHOD FOR ELECTROLESS SURFACE FINISHING ON GLASS

Organization Name

intel corporation

Inventor(s)

Kristof Darmawikarta of Chandler AZ (US)

Steve S. Cho of Chandler AZ (US)

Hiroki Tanaka of Gilbert AZ (US)

Haobo Chen of Chandler AZ (US)

Gang Duan of Chandler AZ (US)

Brandon Christian Marin of Gilbert AZ (US)

Suddhasattwa Nad of Chandler AZ (US)

Srinivas V. Pietambaram of Chandler AZ (US)

APPARATUS AND METHOD FOR ELECTROLESS SURFACE FINISHING ON GLASS - A simplified explanation of the abstract

This abstract first appeared for US patent application 20240194548 titled 'APPARATUS AND METHOD FOR ELECTROLESS SURFACE FINISHING ON GLASS

Simplified Explanation: The patent application describes a method and apparatus for electroless surface finishing on glass, involving planarization of dielectric and solder resist layers to create a flat surface for the glass substrate, enabling the application of an electroless NiPdAu process.

• The innovation involves performing a planarization process on buildup dielectric and/or solder resist layers to create a flat surface for a glass substrate.
• The planar surface allows for the application of an electroless NiPdAu process, resulting in a smooth and uniform finish.
• Surface variations of less than about 5 microns are achieved, enhancing the overall quality of the finished product.

Potential Applications: This technology can be applied in the manufacturing of electronic devices, optical components, and other products requiring precise surface finishing on glass substrates.

Problems Solved: The technology addresses the challenge of achieving a flat and uniform surface finish on glass substrates, which is crucial for the performance and reliability of electronic and optical devices.

Benefits: - Improved surface quality and uniformity - Enhanced performance and reliability of electronic and optical devices - Simplified and efficient surface finishing process

Commercial Applications: The technology can be utilized in the production of semiconductors, displays, sensors, and other high-tech devices where precise surface finishing on glass substrates is essential for optimal performance.

Prior Art: Readers can explore prior research on electroless surface finishing techniques, planarization processes, and glass substrate treatments to gain a deeper understanding of the technology's novelty and potential improvements.

Frequently Updated Research: Researchers are continually exploring advancements in electroless surface finishing techniques, materials science, and nanotechnology to enhance the performance and efficiency of glass substrate treatments.

Questions about Electroless Surface Finishing on Glass: 1. How does the planarization process improve the quality of the glass substrate surface? 2. What are the key advantages of using an electroless NiPdAu process for finishing glass substrates?

Original Abstract Submitted

apparatus and methods for electroless surface finishing on glass. a planarization process is performed on buildup dielectric and/or solder resist to create a flatter, more planar, upper surface for a substrate having a glass layer. planarity is characterized by having surface variations of less than about 5 microns, as measured by recesses and/or protrusions. the planar surface enables finishing the substrate surface with an electroless nipdau process.