Innolux corporation (20240295823). METHOD FOR MANUFACTURING ELECTRONIC DEVICE simplified abstract
Contents
METHOD FOR MANUFACTURING ELECTRONIC DEVICE
Organization Name
Inventor(s)
Chun-Yuan Chuang of Miaoli County (TW)
Ming-Chih Chen of Miaoli County (TW)
Jean Huang of Miaoli County (TW)
Wei-Jen Wang of Miaoli County (TW)
Tao-Lung Cheng of Miaoli County (TW)
METHOD FOR MANUFACTURING ELECTRONIC DEVICE - A simplified explanation of the abstract
This abstract first appeared for US patent application 20240295823 titled 'METHOD FOR MANUFACTURING ELECTRONIC DEVICE
The abstract describes a method for manufacturing an electronic device, involving the use of a substrate, device layer, photoresist layer, photo mask, and light source to create a pattern on the substrate for etching the device layer.
- Substrate provided
- Device layer disposed on substrate
- Photoresist layer applied on device layer
- Photo mask placed on photoresist layer
- Light source used to illuminate photo mask for first exposure region
- Relative movement between substrate and photo mask
- Light source used for second exposure region
- Pattern developed on substrate
- Device layer etched using patterned photoresist layer as mask
- Patterned photoresist layer removed
Potential Applications: - Semiconductor manufacturing - Microelectronics production - Printed circuit board fabrication
Problems Solved: - Precise patterning of electronic devices - Efficient etching process - High-quality device layer fabrication
Benefits: - Improved manufacturing accuracy - Enhanced device performance - Cost-effective production
Commercial Applications: Title: Advanced Electronic Device Manufacturing Method This technology can be utilized in the semiconductor industry for the mass production of electronic devices, leading to faster and more accurate manufacturing processes. The method can also be applied in the production of various microelectronic components, contributing to the advancement of technology in various sectors.
Prior Art: Readers can explore prior research on photolithography, semiconductor manufacturing processes, and device layer etching techniques to gain a deeper understanding of the background of this technology.
Frequently Updated Research: Researchers are constantly developing new methods and technologies to enhance the efficiency and precision of electronic device manufacturing. Stay updated on the latest advancements in photolithography and semiconductor fabrication techniques to incorporate cutting-edge practices into production processes.
Questions about Electronic Device Manufacturing Method: 1. How does this method improve the accuracy of patterning electronic devices? 2. What are the key advantages of using a patterned photoresist layer in the etching process?
Original Abstract Submitted
a method for manufacturing an electronic device is provided. in the method for manufacturing an electronic device, a substrate is provided, a device layer is disposed on the substrate, and a photoresist layer is disposed on the device layer. next, a photo mask is disposed on the photoresist layer, and a light source is used to firstly illuminate the photo mask to form a first exposure region. after that, a relative movement is made between the substrate and the photo mask, and the light source is used to secondly illuminate the photo mask to form a second exposure region, wherein the first exposure region partially overlaps the second exposure region. afterwards, a pattern is developed on the substrate, the device layer is etched using a patterned photoresist layer as an etching mask, and then the patterned photoresist layer is removed.
