IMPRINT APPARATUS, IMPRINT METHOD AND ARTICLE MANUFACTURING METHOD: abstract simplified (18194942)

• This abstract for appeared for patent application number 18194942 Titled 'IMPRINT APPARATUS, IMPRINT METHOD AND ARTICLE MANUFACTURING METHOD'

Simplified Explanation

The abstract describes an imprint apparatus that is used to create patterns on a substrate. The apparatus includes a mechanism to deform the mold and the substrate by applying pressure. A measurement unit is used to measure the deformation of both the mold and the substrate during the separation process. A control unit then adjusts the pressure applied to the mold and substrate based on these measurements to ensure that the difference in deformation between the two falls within an acceptable range.

Original Abstract Submitted

An imprint apparatus including a mold deformation mechanism configured to deform a mold by applying a pressure to the mold, a substrate deformation mechanism configured to deform the substrate by applying a pressure to the substrate, a measurement unit configured to measure a deformation amount of the mold and a deformation amount of the substrate during separating the mold from the cured imprint material on the substrate, and a control unit configured to control, during the separating, a pressure to be applied to the mold by the mold deformation mechanism and a pressure to be applied to the substrate by the substrate deformation mechanism based on the deformation amounts measured by the measurement unit such that a difference between the deformation amount of the mold and the deformation amount of the substrate falls within an allowable range.