Huawei technologies co., ltd. (20240178103). Chip Stacked Structure and Manufacturing Method Thereof, Chip Package Structure, and Electronic Device simplified abstract

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Chip Stacked Structure and Manufacturing Method Thereof, Chip Package Structure, and Electronic Device

Organization Name

huawei technologies co., ltd.

Inventor(s)

Eric Wu of Shenzhen (CN)

Jifeng Zhu of Shanghai (CN)

Chip Stacked Structure and Manufacturing Method Thereof, Chip Package Structure, and Electronic Device - A simplified explanation of the abstract

This abstract first appeared for US patent application 20240178103 titled 'Chip Stacked Structure and Manufacturing Method Thereof, Chip Package Structure, and Electronic Device

Simplified Explanation

The patent application describes a chip stacked structure consisting of a first chip and a second chip, with various layers and through silicon vias connecting them.

  • The first chip includes a first substrate, a first functional layer, and first through silicon vias. The diameter of the through silicon vias close to the functional layer is greater than those close to the substrate.
  • The second chip includes a second substrate and a second functional layer.
  • The structure also includes a first redistribution layer, a first dielectric layer, and a plurality of first bonding metal blocks.

Potential Applications

This technology could be applied in:

  • Advanced semiconductor devices
  • High-performance computing systems
  • Data storage solutions

Problems Solved

This technology helps in:

  • Improving interconnectivity between chips
  • Enhancing overall performance and reliability of stacked structures

Benefits

The benefits of this technology include:

  • Increased data transfer speeds
  • Enhanced thermal management
  • Compact and efficient chip designs

Potential Commercial Applications

The potential commercial applications of this technology could be in:

  • Consumer electronics
  • Telecommunications equipment
  • Automotive systems

Possible Prior Art

One possible prior art for this technology could be the use of through silicon vias in stacked chip structures for improved connectivity and performance.

Unanswered Questions

How does this technology compare to traditional chip stacking methods?

This technology offers improved connectivity and performance compared to traditional methods by utilizing through silicon vias and bonding metal blocks for enhanced interconnectivity.

What are the manufacturing challenges associated with implementing this technology?

Manufacturing challenges may include precise alignment of the layers, controlling the diameter of through silicon vias, and ensuring proper bonding of metal blocks within the structure.


Original Abstract Submitted

a chip stacked structure includes a first chip and a second chip. the first chip includes a first substrate, a first functional layer, and first through silicon vias. a diameter of the first through silicon via close to the first functional layer is greater than a diameter of the first through silicon via close to the first substrate. the second chip includes a second substrate and a second functional layer. the chip stacked structure further includes a first redistribution layer disposed on a side that is of the second functional layer and that is away from the second substrate, a first dielectric layer disposed between the first substrate and the first redistribution layer, and a plurality of first bonding metal blocks disposed in the first dielectric layer.