General Electric Company (20240286343). GAS FLOW SYSTEMS FOR AN ADDITIVE MANUFACTURING MACHINE simplified abstract

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GAS FLOW SYSTEMS FOR AN ADDITIVE MANUFACTURING MACHINE

Organization Name

General Electric Company

Inventor(s)

Justin Mamrak of Loveland OH (US)

MacKenzie Ryan Redding of Mason OH (US)

GAS FLOW SYSTEMS FOR AN ADDITIVE MANUFACTURING MACHINE - A simplified explanation of the abstract

This abstract first appeared for US patent application 20240286343 titled 'GAS FLOW SYSTEMS FOR AN ADDITIVE MANUFACTURING MACHINE

    • Simplified Explanation:**

An additive manufacturing machine with multiple subsystems for various functions like condensate evacuation, cleaning contaminants, and electronics cooling.

    • Key Features and Innovation:**

- Plurality of subsystems for different functions - Dedicated gas circulation loops for each subsystem - Gas circulation device for clean flow of gas to each subsystem

    • Potential Applications:**

- Additive manufacturing industry - Research and development labs - Aerospace and automotive industries

    • Problems Solved:**

- Efficient removal of byproducts near powder bed - Cleaning contaminants from sensitive machine components - Cooling electronics compartment effectively

    • Benefits:**

- Improved machine performance - Enhanced product quality - Increased efficiency in manufacturing process

    • Commercial Applications:**

- "Innovative Additive Manufacturing Machine Subsystems for Enhanced Performance in Various Industries"

    • Questions about Additive Manufacturing Machine Subsystems:**

1. How do the dedicated gas circulation loops contribute to the efficiency of each subsystem? 2. What are the potential cost savings associated with using this advanced additive manufacturing machine?


Original Abstract Submitted

an additive manufacturing machine includes a plurality of subsystems, such as a condensate evacuation subsystem for removing byproducts of the additive manufacturing products near a powder bed, a closed loop subsystem for cleaning contaminants from sensitive machine components, and/or an electronics cooling subsystem for cooling an electronics compartment. each subsystem may include a dedicated gas circulation loop that is operably coupled to a gas circulation device for urging a clean flow of gas to each of the subsystems to perform a particular function.