Fujifilm corporation (20240295813). PHOTOSENSITIVE COMPOSITION simplified abstract
Contents
PHOTOSENSITIVE COMPOSITION
Organization Name
Inventor(s)
Takahiro Okawara of Haibara-gun (JP)
Shoichi Nakamura of Haibara-gun (JP)
Mitsuji Yoshibayashi of Haibara-gun (JP)
PHOTOSENSITIVE COMPOSITION - A simplified explanation of the abstract
This abstract first appeared for US patent application 20240295813 titled 'PHOTOSENSITIVE COMPOSITION
Simplified Explanation: The patent application describes a photosensitive composition that can be exposed to light with a wavelength of 300 nm or shorter. The composition includes a coloring material and a polymerizable monomer, with a total content of the monomer and a photopolymerization initiator not exceeding 15% of the total solids content.
- The photosensitive composition is designed for exposure to light with a wavelength of 300 nm or shorter.
- It contains a coloring material and a polymerizable monomer.
- The total content of the monomer and a photopolymerization initiator is limited to 15% of the total solids content.
Potential Applications: This technology could be used in the production of high-resolution photolithography, microfabrication, and other applications requiring precise exposure to short-wavelength light.
Problems Solved: The technology addresses the need for a photosensitive composition that can effectively respond to light with a wavelength of 300 nm or shorter while maintaining a low content of polymerizable monomer and photopolymerization initiator.
Benefits: - Enhanced sensitivity to short-wavelength light - Improved resolution in photolithography and microfabrication processes - Reduced content of polymerizable monomer and photopolymerization initiator
Commercial Applications: The technology could be valuable in industries such as semiconductor manufacturing, microelectronics, and nanotechnology for producing high-resolution patterns and structures.
Questions about the Technology: 1. How does the photosensitive composition achieve enhanced sensitivity to short-wavelength light? 2. What are the specific advantages of limiting the content of polymerizable monomer and photopolymerization initiator in the composition?
Original Abstract Submitted
a photosensitive composition for exposure to light having a wavelength of 300 nm or shorter, the photosensitive composition including: a coloring material; and a polymerizable monomer, in which the total content of the polymerizable monomer and a photopolymerization initiator is 15 mass % or lower with respect to the total solids content of the photosensitive composition.
