Fabric8Labs, Inc. (20240218546). ELECTROPHORETICALLY-DEPOSITED MASKS ON ELECTRODE ARRAYS simplified abstract

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ELECTROPHORETICALLY-DEPOSITED MASKS ON ELECTRODE ARRAYS

Organization Name

Fabric8Labs, Inc.

Inventor(s)

Sean Stone of San Diego CA (US)

Kareemullah Shaik of San Diego CA (US)

Shiv Shailendar of San Diego CA (US)

ELECTROPHORETICALLY-DEPOSITED MASKS ON ELECTRODE ARRAYS - A simplified explanation of the abstract

This abstract first appeared for US patent application 20240218546 titled 'ELECTROPHORETICALLY-DEPOSITED MASKS ON ELECTRODE ARRAYS

The abstract describes electrochemical-additive manufacturing (ECAM) systems that use electrophoretically-deposited masks to selectively cover electrodes in electrode arrays during the manufacturing process.

  • Electrophoretically-deposited masks with one or more patches can block electric current in specific array portions, preventing electrolytic deposition on corresponding electrode areas.
  • Masks can cover damaged portions of the electrode array or create patterns of inactive array portions, reducing the need for deposition control circuits.
  • Masks can be formed in the ECAM system or externally, through single-stage or multi-stage processes.
  • Mask position can be self-defined based on defect location and severity.

Potential Applications: - Advanced manufacturing processes - Electronics production - Medical device fabrication

Problems Solved: - Preventing unwanted electrolytic deposition - Repairing damaged electrode array portions - Simplifying control circuit requirements

Benefits: - Improved manufacturing precision - Enhanced control over deposition processes - Cost-effective electrode array maintenance

Commercial Applications: Title: Advanced Electrochemical-Additive Manufacturing Systems This technology can revolutionize the manufacturing industry by streamlining production processes, reducing costs, and improving product quality.

Questions about Electrochemical-Additive Manufacturing Systems: 1. How does the use of electrophoretically-deposited masks improve the efficiency of ECAM systems? 2. What are the potential long-term benefits of integrating this technology into various manufacturing sectors?


Original Abstract Submitted

described herein are electrochemical-additive manufacturing (ecam) systems comprising electrophoretically-deposited masks selectively covering a set of individually-addressable electrodes (pixels) in the electrode arrays (printheads). for example, an electrophoretically-deposited mask, comprising one or more patches, can be used to block the electric current through certain array portions thereby preventing electrolytic deposition on the corresponding portions of the deposition electrode during ecam processes. in some examples, electrode array portions can be masked to cover damaged portions (e.g., stuck-on control circuits, electrically and/or ionically conductive passages in the electrode array) and/or to form special patterns of inactive array portions (that no longer need to be controlled using deposition control circuits). such electrophoretically-deposited masks can be formed in an ecam system or an external system. the mask forming can be a single-stage process or a multi-stage process. furthermore, the mask position can be self-defining, e.g., based on defect location and/or severity of defects.