FUJIFILM Corporation patent applications published on July 25th, 2024
Summary of the patent applications from FUJIFILM Corporation on July 25th, 2024
- Summary:**
The recent patents filed by this organization (FUJIFILM Corporation) include innovative technologies such as a processing apparatus for simultaneous recognition and distance measurement, a surface-emitting type semiconductor laser for improved performance, an information processing apparatus for medical data management, and an exposure method for creating high accuracy alignment patterns. These patents showcase advancements in various fields such as robotics, healthcare, displays, and optical devices.
- Key Points of Patents:**
- Processing apparatus for simultaneous recognition and distance measurement. - Surface-emitting type semiconductor laser with a unique structure. - Information processing apparatus for medical data management. - Exposure method for creating high accuracy alignment patterns.
- Notable Applications:**
- Robotics, surveillance, and autonomous vehicles for object recognition and distance measurement. - Telecommunications, optical data storage, and medical devices. - Healthcare industry for patient record management, medical research, and telemedicine platforms. - Manufacturing of displays, optical devices, and sensors for precise alignment patterns.
Contents
- 1 Patent applications for FUJIFILM Corporation on July 25th, 2024
- 1.1 CHEMICAL LIQUID STORAGE BODY (18627780)
- 1.2 PRODUCTION METHOD OF POLYPEPTIDE, TAG, EXPRESSION VECTOR, EVALUATION METHOD OF POLYPEPTIDE, PRODUCTION METHOD OF NUCLEIC ACID DISPLAY LIBRARY, AND SCREENING METHOD (18597128)
- 1.3 ZOOM LENS, PROJECTION TYPE DISPLAY DEVICE, AND IMAGING APPARATUS (18413023)
- 1.4 LENS DEVICE (18408570)
- 1.5 CAMERA (18418346)
- 1.6 ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN (18610965)
- 1.7 ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, METHOD FOR MANUFACTURING ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE FILM, PATTERN FORMING METHOD, METHOD FOR MANUFACTURING ELECTRONIC DEVICE, RESIN, AND METHOD FOR MANUFACTURING RESIN ([[FUJIFILM Corporation (18418023). ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, METHOD FOR MANUFACTURING ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE FILM, PATTERN FORMING METHOD, METHOD FOR MANUFACTURING ELECTRONIC DEVICE, RESIN, AND METHOD FOR MANUFACTURING RESIN simplified abstract|18418023]])
- 1.8 EXPOSURE METHOD, EXPOSURE DEVICE, AND METHOD OF MANUFACTURING OPTICALLY-ANISOTROPIC LAYER (18628911)
- 1.9 INFORMATION PROCESSING APPARATUS, INFORMATION PROCESSING METHOD, AND INFORMATION PROCESSING PROGRAM (18624095)
- 1.10 SURFACE-EMITTING TYPE SEMICONDUCTOR LASER, OPTICAL TRANSMISSION APPARATUS, AND MANUFACTURING METHOD OF SURFACE-EMITTING TYPE SEMICONDUCTOR LASER (18494309)
- 1.11 PROCESSING APPARATUS, ELECTRONIC APPARATUS, PROCESSING METHOD, AND PROGRAM (18624991)
Patent applications for FUJIFILM Corporation on July 25th, 2024
CHEMICAL LIQUID STORAGE BODY (18627780)
Main Inventor
Tetsuya Kamimura
PRODUCTION METHOD OF POLYPEPTIDE, TAG, EXPRESSION VECTOR, EVALUATION METHOD OF POLYPEPTIDE, PRODUCTION METHOD OF NUCLEIC ACID DISPLAY LIBRARY, AND SCREENING METHOD (18597128)
Main Inventor
Ken MATSUI
ZOOM LENS, PROJECTION TYPE DISPLAY DEVICE, AND IMAGING APPARATUS (18413023)
Main Inventor
Taku FURUBAYASHI
LENS DEVICE (18408570)
Main Inventor
Nobuyuki KONDO
CAMERA (18418346)
Main Inventor
Koji SEKIZAWA
ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN (18610965)
Main Inventor
Naohiro TANGO
ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, METHOD FOR MANUFACTURING ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE FILM, PATTERN FORMING METHOD, METHOD FOR MANUFACTURING ELECTRONIC DEVICE, RESIN, AND METHOD FOR MANUFACTURING RESIN ([[FUJIFILM Corporation (18418023). ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, METHOD FOR MANUFACTURING ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE FILM, PATTERN FORMING METHOD, METHOD FOR MANUFACTURING ELECTRONIC DEVICE, RESIN, AND METHOD FOR MANUFACTURING RESIN simplified abstract|18418023]])
Main Inventor
Tsutomu YOSHIMURA
EXPOSURE METHOD, EXPOSURE DEVICE, AND METHOD OF MANUFACTURING OPTICALLY-ANISOTROPIC LAYER (18628911)
Main Inventor
Hirotoshi ANDO
INFORMATION PROCESSING APPARATUS, INFORMATION PROCESSING METHOD, AND INFORMATION PROCESSING PROGRAM (18624095)
Main Inventor
Takayuki MATSUURA
SURFACE-EMITTING TYPE SEMICONDUCTOR LASER, OPTICAL TRANSMISSION APPARATUS, AND MANUFACTURING METHOD OF SURFACE-EMITTING TYPE SEMICONDUCTOR LASER (18494309)
Main Inventor
Naoya SEKITA
PROCESSING APPARATUS, ELECTRONIC APPARATUS, PROCESSING METHOD, AND PROGRAM (18624991)
Main Inventor
Kenkichi HAYASHI
