Contemporary amperex technology co., limited (20240309515). ETCHING DEVICE simplified abstract
Contents
ETCHING DEVICE
Organization Name
contemporary amperex technology co., limited
Inventor(s)
ETCHING DEVICE - A simplified explanation of the abstract
This abstract first appeared for US patent application 20240309515 titled 'ETCHING DEVICE
Simplified Explanation: The patent application describes an etching device that can create an opening structure efficiently and cost-effectively. It consists of a porous roller with etching liquid inside and openings, and a pressing roller to attach a metal layer for etching.
- The etching device includes a porous roller with openings at both ends and etching liquid inside.
- A pressing roller is attached to the porous roller to press and attach a metal layer for etching.
- During rotation, the etching liquid passes through the openings to continuously etch the metal layer.
Key Features and Innovation:
- Porous roller design with etching liquid for continuous etching process.
- Pressing roller for attaching metal layer securely.
- Cost-effective and simplified process for creating opening structures.
Potential Applications: The technology can be used in industries requiring precise and cost-effective etching processes, such as electronics, semiconductor manufacturing, and printing.
Problems Solved: The device addresses the need for a more efficient and affordable method for creating opening structures on metal surfaces.
Benefits:
- Cost-effective etching process.
- Simplified method for creating opening structures.
- Continuous etching for consistent results.
Commercial Applications: The technology can be applied in industries like electronics manufacturing, semiconductor fabrication, and printing for efficient and precise etching processes.
Prior Art: Readers can explore prior art related to etching devices, porous rollers, and metal surface treatments in industries like electronics and manufacturing.
Frequently Updated Research: Stay updated on advancements in etching technologies, porous materials, and surface treatment methods for industrial applications.
Questions about Etching Devices: 1. How does the porous roller design contribute to the efficiency of the etching process? 2. What are the potential cost savings associated with using this etching device compared to traditional methods?
Original Abstract Submitted
provided an etching device that is capable of effectively realizing an opening structure with low cost and simplified process. the etching device includes: a porous roller, the porous roller being a hollow structure with openings at both ends, an etching liquid being accommodated in the hollow structure, and the porous roller being provided with a plurality of openings; a pressing roller, attached to the porous roller and arranged above the liquid level of the etching liquid, for pressing and attaching a metal layer to be etched onto the surface of the porous roller; wherein during rotation of the porous roller, the etching liquid passes through at least part of the openings of the plurality of openings and continuously soaks the metal layer in contact with the at least part of the openings, so as to continuously etch the metal layer in contact with the at least part of the openings.
