Contemporary amperex technology co., limited (20240264541). EXPOSURE APPARATUS simplified abstract
Contents
EXPOSURE APPARATUS
Organization Name
contemporary amperex technology co., limited
Inventor(s)
EXPOSURE APPARATUS - A simplified explanation of the abstract
This abstract first appeared for US patent application 20240264541 titled 'EXPOSURE APPARATUS
The exposure apparatus described in the patent application consists of a conveying mechanism and an exposure mechanism. The conveying mechanism moves a substrate coated with photoresist, while the exposure mechanism includes an exposure source and an exposure member.
- The exposure source emits light onto the substrate for the exposure process.
- The exposure member has an exposure section facing the substrate, with a light-transmitting portion and a light-shielding portion.
- The exposure section moves in synchronization with the substrate to ensure proper exposure.
- The light-transmitting portion allows light to reach the substrate, while the light-shielding portion blocks unwanted light.
- This design ensures precise and controlled exposure of the photoresist on the substrate.
Potential Applications: - Semiconductor manufacturing - Printed circuit board production - Microelectronics fabrication
Problems Solved: - Accurate and uniform exposure of photoresist on substrates - Minimization of light interference during the exposure process
Benefits: - Improved quality and consistency in pattern transfer - Enhanced efficiency in the production of electronic components
Commercial Applications: "Advanced Exposure Apparatus for Semiconductor Manufacturing: Enhancing Precision and Efficiency"
Questions about the technology: 1. How does the exposure member ensure synchronized movement with the substrate? 2. What are the advantages of having both a light-transmitting and light-shielding portion in the exposure section?
Original Abstract Submitted
an exposure apparatus includes a conveying mechanism and an exposure mechanism. the conveying mechanism is configured to convey a substrate, a surface of the substrate being coated with photoresist. the exposure mechanism includes an exposure source and an exposure member. the exposure source is configured to provide light to the substrate. the exposure member includes an exposure section opposite the substrate, where the exposure section is located between the exposure source and the substrate and disposed in close proximity to the substrate, the exposure section has a light-transmitting portion that allows light to be incident on the substrate and a light-shielding portion that prevents light from being incident on the substrate, and the exposure section is configured to keep the light-transmitting portion and the light-shielding portion in synchronized movement with the substrate.
